Low resistivity quasi-epitaxial Mo-Ta alloy and high-quality anodic oxide for a-Si thin-film transistor liquid-crystal display von IKEDA, M, DOHJO, M, OANA, Y

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SiOx/TaOx gate insulator a-Si TFT for liquid crystal displays von IKEDA, M, DOHJO, M, AOKI, T

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Preparation and properties of a-SiGe:H:F films by a glow discharge decomposition von TSUDA, S, TARUI, H, FUKATSU, T, NAKAYAMA, S, OHNISHI, M, NAKANO, S, KUWANO, Y, HAKU, H, DOHJO, H, WATANABE, K, HISHIKAWA, Y, NAKAMURA, N, NAKASHIMA, Y, TAKAHAMA, T, NISHIWAKI, H

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Liquid crystal display device with a protecting film that partially overlaps a display pixel electrode von INADA, KATSUHIKO, TANAKA, YASUHARU, KUBO, AKIRA, DOHJO, MASAYUKI

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LCD AND ITS PRODUCTION von INADA, KATSUHIKO, DOHJO, MASAYUKI, KUBO, AKIRA, TANAKA, YASUHARU

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A 9.5-inch Color Liquid Crystal Display Addressed by α-Si TFTs von Suzuki, Kouji, Aoki, Toshio, Ikeda, Mitsushi, Higuchi, Toyoki, Akiyama, Masahiko, Dohjo, Masayuki, Niiyama, Takako, Oana, Yasuhisa

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Origins of thin film delamination induced by electrodeposition and processing methods to overcome it von Ni, Longchang, Pocratsky, Ryan M., de Boer, Maarten P.

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Correlation between structure and optical properties of Si-based alloys deposited by PECVD von Giangregorio, M.M., Losurdo, M., Sacchetti, A., Capezzuto, P., Bruno, G.

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Suppression of Schottky leakage current in island-in amorphous silicon thin film transistors with the Cu∕CuMg as source/drain metal von Wang, M. C., Chang, T. C., Liu, Po-Tsun, Xiao, R. W., Lin, L. F., Li, Y. Y., Huang, F. S., Chen, J. R.

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Characterization of anodic aluminum oxide film and its application to amorphous silicon thin film transistors von Liang, C.W., Luo, T.C., Feng, M.S., Cheng, H.C., Su, David

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Suppression of Schottky leakage current in island-in amorphous silicon thin film transistors with the Cu ∕ Cu Mg as source/drain metal von Wang, M. C., Chang, T. C., Liu, Po-Tsun, Xiao, R. W., Lin, L. F., Li, Y. Y., Huang, F. S., Chen, J. R.

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Cu∕CuMg Gate Electrode for the Application of Hydrogenated Amorphous Silicon Thin-Film Transistors von Wang, M. C., Chang, T.-C., Liu, Po-Tsun, Li, Y. Y., Xiao, R. W., Lin, L. F., Chen, J. R.

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Light induced defects in amorphous silicon-carbon alloys a-SiC:H von Rejeb, S.H., Gharbi, R., Fathallaha, M., Demichelis, F., Pirri, C.F., Tresso, E., Crovini, G.

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P-79: Characterization of Narrow-Channel TFT Using Asymmetric Halftone Exposure von Chun, Ki-Chul, Woo, Juhyun, Jung, Deuk-soo, Park, Mungi, Kim, Hwan, Lim, Byoung-Ho, Yu, Sang-Jeon

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Growth of a-Si:H and related alloys using liquid organic sources von Gaughan, K., Hershgold, S., Viner, J.M., Taylor, P.C.

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Plasma Treatment Effect on the Off Current Characteristics of a-Si Thin Film Transistor von WASHIZUKA, Isamu, YABUTA, Satoshi, OKAMOTO, Masaya

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Stress and resistivity of Ta-Mo and Ta-W sputtered thin films von OSHIO, S, TAKEDA, M, MATSUOKA, T

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Impurity doping in chemically vapor-deposited amorphous hydrogenated silicon from disilane von ASHIDA, Y, MISHIMA, Y, HIROSE, M, OSAKA, Y

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56.3: High Corrosion Resistance Mo Alloy for TFT-LCD and Touch Screen Panel Metallization von Winkler, Jörg, Reinfried, Nikolaus, Knabl, Wolfram

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A delta-doped amorphous silicon thin-film transistor with high mobility and stability von Kim, Pyunghun, Lee, Kyung Min, Lee, Eui-Wan, Jo, Younjung, Kim, Do-Hyung, Kim, Hong-jae, Yang, Key Young, Son, Hyunji, Choi, Hyun Chul

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