In Situ Infrared Absorption Study of Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride von Peña, Luis Fabián, Mattson, Eric C, Nanayakkara, Charith E, Oyekan, Kolade A, Mallikarjunan, Anupama, Chandra, Haripin, Xiao, Manchao, Lei, Xinjian, Pearlstein, Ronald M, Derecskei-Kovacs, Agnes, Chabal, Yves J

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Ab initio study of OH addition reaction to isoprene von Lei, Wenfang, Derecskei-Kovacs, Agnes, Zhang, Renyi

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Through-space 13C–19F coupling can reveal conformations of modified BODIPY dyes von Chen, Jiong, Reibenspies, Joe, Derecskei-Kovacs, Agnes, Burgess, Kevin

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Theoretical Study of OH−O2−Isoprene Peroxy Radicals von Lei, Wenfang, Zhang, Renyi, McGivern, W. Sean, Derecskei-Kovacs, Agnes, North, Simon W

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Theoretical study of isomeric branching in the isoprene–OH reaction: implications to final product yields in isoprene oxidation von Lei, Wenfang, Zhang, Renyi, Sean McGivern, W, Derecskei-Kovacs, Agnes, North, Simon W

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Primary and Secondary Processes in the Photodissociation of CHBr3 von McGivern, W. Sean, Sorkhabi, Osman, Suits, Arthur G, Derecskei-Kovacs, Agnes, North, Simon W

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On the Mechanisms of SiO 2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis( t -butylamino)silane on the Hydroxylated SiO 2 (001) Surface von Han, Bo, Zhang, Qingfan, Wu, Jinping, Han, Bing, Karwacki, Eugene J., Derecskei, Agnes, Xiao, Manchao, Lei, Xinjian, O’Neill, Mark L., Cheng, Hansong

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On the Mechanisms of SiO2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO2(001) Surface von Han, Bo, Zhang, Qingfan, Wu, Jinping, Han, Bing, Karwacki, Eugene J, Derecskei, Agnes, Xiao, Manchao, Lei, Xinjian, O’Neill, Mark L, Cheng, Hansong

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Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone von Peña, Luis Fabián, Nanayakkara, Charith E, Mallikarjunan, Anupama, Chandra, Haripin, Xiao, Manchao, Lei, Xinjian, Pearlstein, Ronald M, Derecskei-Kovacs, Agnes, Chabal, Yves J

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Vapor-Phase Cleaning and Corrosion Inhibition of Copper Films by Ethanol and Heterocyclic Amines von Peña, Luis Fabián, Veyan, Jean-Francois, Todd, Michael A, Derecskei-Kovacs, Agnes, Chabal, Yves J

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Investigation of the Electronic and Geometric Effects of Trifluoromethyl Substituents on Tris(pyrazolyl)borate Ligands Using Manganese(I) and Copper(I) Complexes von Dias, H. V. Rasika, Kim, Hyoung-Juhn, Lu, Hui-Ling, Rajeshwar, Krishnan, de Tacconi, Norma R, Derecskei-Kovacs, Agnes, Marynick, Dennis S

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4,4-Difluoro-4-bora-3a,4a-diaza-s-indacene (BODIPY) Dyes Modified for Extended Conjugation and Restricted Bond Rotations von Chen, Jiong, Burghart, Armin, Derecskei-Kovacs, Agnes, Burgess, Kevin

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Density functional theory study on the full ALD process of silicon nitride thin film deposition via BDEAS or BTBAS and NH3 von Huang, Liang, Han, Bo, Han, Bing, Derecskei-Kovacs, Agnes, Xiao, Manchao, Lei, Xinjian, O'Neill, Mark L, Pearlstein, Ronald M, Chandra, Haripin, Cheng, Hansong

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Designing high performance precursors for atomic layer deposition of silicon oxide von Mallikarjunan, Anupama, Chandra, Haripin, Xiao, Manchao, Lei, Xinjian, Pearlstein, Ronald M., Bowen, Heather R., O'Neill, Mark L., Derecskei-Kovacs, Agnes, Han, Bing

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Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride von Dangerfield, Aaron, Nanayakkara, Charith E, Mallikarjunan, Anupama, Lei, Xinjian, Pearlstein, Ronald M, Derecskei-Kovacs, Agnes, Cure, Jeremy, Estève, Alain, Chabal, Yves J

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Crystal structures of heptakis(2,6-di- O- tert-butyldimethylsilyl)cyclomaltoheptaose, heptakis(2- O-methyl-3,6-di- O- tert-butyldimethylsilyl)cyclomaltoheptaose and heptakis(2- O-m... von Reibenspies, Joseph H., Maynard, Dawn Kirby, Derecskei-Kovacs, Agnes, Vigh, Gyula

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First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO2 Thin Films with Di(sec-butylamino)silane and Ozone von Huang, Liang, Han, Bo, Han, Bing, Derecskei-Kovacs, Agnes, Xiao, Manchao, Lei, Xinjian, O’Neill, Mark L, Pearlstein, Ronald M, Chandra, Haripin, Cheng, Hansong

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TUNGSTEN CHEMICAL MECHANICAL POLISHING SLURRIES von STENDER, Matthias, DERECSKEI, Agnes, BRENNAN, Bradley

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Tungsten chemical mechanical planarization (CMP) with low dishing and low erosion topography von Stender, Matthias, Derecskei, Agnes, Brennan, Bradley J

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Atomic-level molecular modeling of the nonionic surfactant Triton X-100: the OPE9 component in vacuum and water von Derecskei-Kovacs, A, Derecskei, B, Schelly, Z A

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