Thermochromism of Polydiacetylenes Containing Robust 2D Hydrogen Bond Network of Naphthylmethylammonium Carboxylates von Dei, Satoshi, Shimogaki, Tomoyo, Matsumoto, Akikazu

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Novel High Sensitivity EUV Photoresist for Sub-7 nm Node von Nagai, Tomoki, Nakagawa, Hisashi, Naruoka, Takehiko, Dei, Satoshi, Tagawa, Seiichi, Oshima, Akihiro, Nagahara, Seiji, Shiraishi, Gosuke, Yoshihara, Kosuke, Terashita, Yuichi, Minekawa, Yukie, Buitrago, Elizabeth, Ekinci, Yasin, Yildirim, Oktay, Meeuwissen, Marieke, Hoefnagels, Rik, Rispens, Gijsbert, Verspaget, Coen, Maas, Raymond

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Columnar mesophases constructed by hierarchical self-organization of rod-like diacetylene molecules von Shimogaki, Tomoyo, Dei, Satoshi, Ohta, Kazuchika, Matsumoto, Akikazu

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Thermochromism of Polydiacetylene with a Hysteresis Loop in the Solid State and in Solution von Dei, Satoshi, Matsumoto, Akikazu

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Thermochromism of Polydiacetylenes in the Solid State and in Solution by the Self-Organization of Polymer Chains Containing No Polar Group von Dei, Satoshi, Matsumoto, Akinori, Matsumoto, Akikazu

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Synthesis, Structure, Chromatic Properties, and Induced Circular Dichromism of Polydiacetylenes with an Extended Conjugated System in the Side Chain von Dei, Satoshi, Matsumoto, Akikazu

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Mesomorphic and polymerization behaviors of 4-(icosa-1,3-diynyl)benzoic acid von Dei, Satoshi, Shimogaki, Tomoyo, Matsumoto, Akikazu

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SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD AND COMPOSITION von YONEDA, Eiji, YOSHINAKA, Sho, TANAKA, Ryotaro, DEI, Satoshi, MIYAUCHI, Hiroyuki

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METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, AND COMPOSITION von Dei, Satoshi, Miyauchi, Hiroyuki, TAKANASHI, Kazunori, Okumura, Nao, Kawazu, Tomoharu

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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION von YONEDA, Eiji, YOSHINAKA, Sho, KOMATSU, Hiroyuki, DEI, Satoshi, DOBASHI, Masato, KATAGIRI, Takashi, EHARA, Kengo

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METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION von YONEDA, Eiji, YOSHINAKA, Sho, KOMATSU, Hiroyuki, DEI, Satoshi, DOBASHI, Masato, KATAGIRI, Takashi, EHARA, Kengo

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COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD OF FORMING RESIST PATTERN von Dei, Satoshi, Abe, Tsubasa, Katagiri, Takashi, TAKAGI, Yugaku, Takanashi, Kazunori, Hayashi, Yuya

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Resist underlayer film-forming composition, and method for manufacturing semiconductor substrate von DEI, SATOSHI, YAMADA, SHUHEI, HAYASHI, YUYA, YONEDA, EIJI, AKITA, SHUNPEI

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RESIST UNDERLAYER FILM-FORMING COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE von YONEDA, Eiji, HAYASHI, Yuya, DEI, Satoshi, YAMADA, Shuhei, AKITA, Shunpei

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반도체 기판의 제조 방법 및 레지스트 하층막 형성용 조성물 von DEI SATOSHI, MIYAUCHI HIROYUKI, TANAKA RYOTARO, YONEDA EIJI, YOSHINAKA SHO

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Method for forming pattern, and polysiloxane composition von Dei Satoshi, Takanashi Kazunori, Mori Takashi

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보호막 형성용 조성물, 보호막, 보호막의 형성 방법 및 기판의 제조 방법 von DEI SATOSHI, TAKANASHI KAZUNORI, MIYAUCHI HIROYUKI, KAWAZU TOMOHARU, OKUMURA NAO

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Semiconductor substrate production method and composition for forming resist underlayer film von DEI, SATOSHI, YONEDA, EIJI, MIYAUCHI, HIROYUKI, YOSHINAKA, SHO, TANAKA, RYOTARO

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COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND POLYMER FOR FORMING RESIST UNDERLAYER FILM von TATSUBO, Daiki, DEI, Satoshi, YAMADA, Shuhei, DOBASHI, Masato, MAYUMI, Kosuke, EHARA, Kengo

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SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM von YONEDA, Eiji, YOSHINAKA, Sho, TANAKA, Ryotaro, DEI, Satoshi, MIYAUCHI, Hiroyuki

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