Sequential Infiltration Synthesis for Line Edge Roughness Mitigation of EUV Resist von Baryshnikova, Marina, Simone, Danilo De, Knaepen, Werner, Kachel, Krzysztof, Chan, BT, Paolillo, Sara, Maes, Jan Willem, Roest, David De, Delgadillo, Paulina Rincon, Vandenberghe, Geert

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Integration and Dielectric Reliability of 30 nm Half Pitch Structures in Aurora ® LK HM von Demuynck, Steven, Huffman, Craig, Claes, Martine, Suhard, Samuel, Versluijs, Janko, Volders, Henny, Heylen, Nancy, Kellens, Kristof, Croes, Kristof, Struyf, Herbert, Vereecke, Guy, Verdonck, Patrick, Roest, David De, Beynet, Julien, Sprey, Hessel, Beyer, Gerald P.

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Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance von Marsik, Premysl, Urbanowicz, Adam M., Verdonck, Patrick, De Roest, David, Sprey, Hessel, Baklanov, Mikhail R.

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Dielectric Reliability of 50 nm Half Pitch Structures in Aurora ® LK von Demuynck, Steven, Kim, Honggun, Huffman, Craig, Darnon, Maxime, Struyf, Herbert, Versluijs, Janko, Claes, Martine, Vereecke, Guy, Verdonck, Patrick, Volders, Henny, Heylen, Nancy, Kellens, Kristof, Roest, David De, Sprey, Hessel, Beyer, Gerald

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Integration of Porogen-Based Low-$k$ Films: Influence of Capping Layer Thickness and Long Thermal Anneals on Low-$k$ Damage and Reliability von Roest, David De, Vereecke, Bart, Huffman, Craig, Heylen, Nancy, Croes, Kristof, Arai, Hirofumi, Takamure, Noboru, Beynet, Julien, Sprey, Hessel, Matsushita, Kiyohiro, Kobayashi, Nobuyoshi, Verdonck, Patrick, Demuynck, Steven, Beyer, Gerald, Tokei, Zsolt, Struyf, Herbert

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Influence of porosity on electrical properties of low-k dielectrics von Van Besien, Els, Pantouvaki, Marianna, Zhao, Larry, De Roest, David, Baklanov, Mikhail R., Tőkei, Zsolt, Beyer, Gerald

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Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with $k = 2.0 von Kimura, Yosuke, Ishikawa, Dai, Nakano, Akinori, Kobayashi, Akiko, Matsushita, Kiyohiro, Roest, David de, Kobayashi, Nobuyoshi

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Characterization and optimization of porogen-based PECVD deposited extreme low- k materials as a function of UV-cure time von Verdonck, Patrick, De Roest, David, Kaneko, Shinya, Caluwaerts, Rudy, Tsuji, Naoto, Matsushita, Kiyohiro, Kemeling, Nathan, Travaly, Youssef, Sprey, Hessel, Schaekers, Marc, Beyer, Gerald

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Influence of the UV Cure on Advanced Plasma Enhanced Chemical Vapour Deposition Low-$k$ Materials von Verdonck, Patrick, Besien, Els Van, Vanstreels, Kris, Trompoukis, Christos, Urbanowicz, Adam, Roest, David De, Baklanov, Mikhail R

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The Improvement of Subthreshold Slope and Transconductance of p-Type Bulk Si Field-Effect Transistors by Solid-Source Doping von Kikuchi, Yoshiaki, Chiarella, Thomas, De Roest, David, Kenis, Karine, Ong, Patrick, Horiguchi, Naoto

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Porogen residues detection in optical properties of low- k dielectrics cured by ultraviolet radiation von Marsik, Premysl, Verdonck, Patrick, De Roest, David, Baklanov, Mikhail R.

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Impact of Hydrocarbon Control in Ultraviolet-Assisted Restoration Process for Extremely Porous Plasma Enhanced Chemical Vapor Deposition SiOCH Films with k = 2.0 von Kimura, Yosuke, Ishikawa, Dai, Nakano, Akinori, Kobayashi, Akiko, Matsushita, Kiyohiro, Roest, David de, Kobayashi, Nobuyoshi

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New approach for calculation of line parameters of IC interconnects von Ymeri, Hasan, Nauwelaers, Bart, Maex, Karen, De Roest, David

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A robust k ∼ 2.3 SiCOH low- k film formed by porogen removal with UV-cure von Kemeling, Nathan, Matsushita, Kiyohiro, Tsuji, Naoto, Kagami, Ken-ichi, Kato, Manabu, Kaneko, Shinya, Sprey, Hessel, de Roest, David, Kobayashi, Nobuyoshi

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Structures and methods for use in photolithography von Piumi, Daniele, de Roest, David Kurt

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Method for selectively depositing a metallic film on a substrate von Longrie, Delphine, de Roest, David Kurt

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Influence of the UV Cure on Advanced Plasma Enhanced Chemical Vapour Deposition Low- k Materials von Verdonck, Patrick, Besien, Els Van, Vanstreels, Kris, Trompoukis, Christos, Urbanowicz, Adam, Roest, David De, Baklanov, Mikhail R.

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Method of forming a structure on a substrate von Blanquart, Timothee, de Roest, David

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STRUCTURES AND METHODS FOR USE IN PHOTOLITHOGRAPHY von Piumi, Daniele, de Roest, David Kurt

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SUBSTRATE PROCESSING APPARATUS AND METHOD von de Roest, David Kurt

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