Flight mass-spectrometer calibration in a high-velocity atomic-oxygen beam von Cross, Jon B, Koontz, Steven L, Hunton, Don E

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EOIM-III mass spectrometry and polymer chemistry - STS 46, July-August 1992 von Koontz, Steven L, Leger, Lubert J, Visentine, James T, Hunton, Donald E, Cross, Jon B, Hakes, Charles L

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Oxygen interactions with materials III - Mission and induced environments von Koontz, Steven L, Leger, Lubert J, Rickman, Steven L, Hakes, Charles L, Bui, David T, Hunton, Donald E, Cross, Jon B

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More investigations into elemental fractionation resulting from laser ablation–inductively coupled plasma–mass spectrometry on glass samples von Figg, Deborah J., Cross, Jon B., Brink, Chris

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High repetition rate pulsed nozzle beam source von Cross, Jon B., Valentini, James J.

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High kinetic energy (1–10 eV) laser sustained neutral atom beam source von Cross, Jon B., Cremers, David A.

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The photodissociation cage effect in van der Waals complexes: Fluorescence spectra of I2  B (3Π0+ u ) from the hindered photodissociation of I2Ar at 488 nm von Valentini, James J., Cross, Jon B.

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A specialized torsion balance designed to measure the absolute flux density of hyperthermal molecular beams containing reactive species von Cook, Steven R., Hoffbauer, Mark A., Cross, Jon B., Wellenstein, Hermann, Fink, Manfred

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Molecular beam kinetics: D + ClF3 von Cross, Jon B.

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Reply to ``Comment on molecular beam kinetics: D+CIF3'' by Hellmut Haberland and Konrad Schmidt von Cross, Jon B.

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A molecular beam study of the trapping desorption of I 2 from a LiF(001) surface von Cross, Jon B., Lurie, Jonathan B.

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Laboratory investigations: Low Earth orbit environment chemistry with spacecraft surfaces von Cross, Jon B.

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A molecular beam study of the trapping-desorption of I2 from a LiF(001) surface von CROSS, J. B, LURIE, J. B

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D + ClF₃ : molecular-beam kinetics / by Jon B. Cross von Cross, Jon B

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Ground-based simulation of LEO environment: Investigations of a select LDEF material: FEP Teflon (trademark) von Cross, Jon B., Koontz, Steven L.

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Method for anisotropic etching in the manufacture of semiconductor devices von CROSS, JON B, KOONTZ, STEVEN L

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Method for anisotropic etching in the manufacture of semiconductor devices von Koontz, Steven L., Cross, Jon B.

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OXIDATION OF GALLIUM ARSENIDE von HOFFBAUER, MARK, A, CROSS, JON, B

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Laser sustained discharge nozzle apparatus for the production of an intense beam of high kinetic energy atomic species von CROSS, JON B, CREMERS, DAVID A

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Measurements of the reduced force coefficients for H 2 , N 2 , CO, and CO 2 incident upon a solar panel array material, SiO 2 -coated Kapton, Kapton, and Z-93-coated Al von Cook, Steven R., Hoffbauer, Mark A., Clark, David D., Cross, Jon B.

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