Correlative analysis of embedded silicon interface passivation by Kelvin probe force microscopy and corona oxide characterization of semiconductor von Aubriet, Valentin, Courouble, Kristell, Gros-Jean, Mickael, Borowik, Łukasz

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Hidden surface photovoltages revealed by pump probe KPFM von Aubriet, Valentin, Courouble, Kristell, Bardagot, Olivier, Demadrille, Renaud, Borowik, Łukasz, Grévin, Benjamin

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(Digital Presentation) Characterization of Passivation Dielectrics on Silicon Through Second Harmonic Generation: Effect of Fixed Charge von Obeid, Baydaa, Bastard, Lionel, Aubriet, Valentin, Courouble, Kristell, Dutartre, Didier, Ionica, Irina

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Hydrogen passivation of silicon/silicon oxide interface by atomic layer deposited hafnium oxide and impact of silicon oxide underlayer von Oudot, Evan, Gros-Jean, Mickael, Courouble, Kristell, Bertin, Francois, Duru, Romain, Rochat, Névine, Vallée, Christophe

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Industrial Challenges of TiN Hard Mask Wet Removal Process for 14nm Technology Node von Buisine, Fabrice, Iwasaki, Akihisa, Cooper, Emanuel, Broussous, Lucile, Courouble, Kristell, Lippy, Steven, Kennedy, Evelyn, Zoll, Stephane, Ishikawa, Hidekazu

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"Damage Free" Cleaning for Advanced BEOL Interconnections von Richard, Emmanuel, Pernel, Carole, Courouble, Kristell, Loup, Virginie, Broussous, Lucile, Lévy, Didier

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(Digital Presentation) Characterization of Passivation Dielectrics on Silicon Through Second Harmonic Generation: Effect of Fixed Charge von Obeid, Baydaa, Bastard, Lionel, Aubriet, Valentin, Courouble, Kristell, Dutartre, Didier, Ionica, Irina

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Hidden surface photovoltages revealed by pump probe KPFM von Aubriet, Valentin, Courouble, Kristell, Bardagot, Olivier, Demadrille, Renaud, Borowik, Lukas, Grévin, Benjamin

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