Contact Resistance Reduction to FinFET Source/Drain Using Novel Dielectric Dipole Schottky Barrier Height Modulation Method von Coss, B. E., Smith, C., Wei-Yip Loh, Majhi, P., Wallace, R. M., Kim, J., Jammy, R.

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In-situ X-ray photoelectron spectroscopy of trimethyl aluminum and water half-cycle treatments on HF-treated and O3-oxidized GaN substrates von Sivasubramani, Prasanna, Park, Tae Joo, Coss, Brian E., Lucero, Antonio, Huang, Jie, Brennan, Barry, Cao, Yu, Jena, Debdeep, Xing, Huili (Grace), Wallace, Robert M., Kim, Jiyoung

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Measurement of Schottky barrier height tuning using dielectric dipole insertion method at metal–semiconductor interfaces by photoelectron spectroscopy and electrical characterizati... von Coss, Brian E., Sivasubramani, Prasanna, Brennan, Barry, Majhi, Prashant, Wallace, Robert M., Kim, Jiyoung

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Dielectric dipole mitigated Schottky barrier height tuning using atomic layer deposited aluminum oxide for contact resistance reduction von Coss, Brian E., Loh, Wei-Yip, Carlo Floresca, Herman, Kim, Moon J., Majhi, Prashant, Wallace, Robert M., Kim, Jiyoung, Jammy, Raj

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In‐situ X‐ray photoelectron spectroscopy of trimethyl aluminum and water half‐cycle treatments on HF‐treated and O 3 ‐oxidized GaN substrates von Sivasubramani, Prasanna, Park, Tae Joo, Coss, Brian E., Lucero, Antonio, Huang, Jie, Brennan, Barry, Cao, Yu, Jena, Debdeep, Xing, Huili (Grace), Wallace, Robert M., Kim, Jiyoung

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Effects of O 3 and H 2 O oxidants on C and N-related impurities in atomic-layer-deposited La 2 O 3 films observed by in situ x-ray photoelectron spectroscopy von Park, Tae Joo, Sivasubramani, Prasanna, Coss, Brian E., Kim, Hyun-Chul, Lee, Bongki, Wallace, Robert M., Kim, Jiyoung, Rousseau, Mike, Liu, Xinye, Li, Huazhi, Lehn, Jean-Sebastien, Hong, Daewon, Shenai, Deo

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Effects of O{sub 3} and H{sub 2}O oxidants on C and N-related impurities in atomic-layer-deposited La{sub 2}O{sub 3} films observed by in situ x-ray photoelectron spectroscopy von Park, Tae Joo, Sivasubramani, Prasanna, Coss, Brian E., Kim, Hyun-Chul, Lee, Bongki, Wallace, Robert M., Kim, Jiyoung, Rousseau, Mike, Liu Xinye, Li Huazhi, Lehn, Jean-Sebastien, Hong, Daewon, Shenai, Deo

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Effects of O3 and H2O oxidants on C and N-related impurities in atomic-layer-deposited La2O3 films observed by in situ x-ray photoelectron spectroscopy von Park, Tae Joo, Sivasubramani, Prasanna, Coss, Brian E., Kim, Hyun-Chul, Lee, Bongki, Wallace, Robert M., Kim, Jiyoung, Rousseau, Mike, Liu, Xinye, Li, Huazhi, Lehn, Jean-Sebastien, Hong, Daewon, Shenai, Deo

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CMOS band-edge schottky barrier heights using dielectric-dipole mitigated (DDM) metal/Si for source/drain contact resistance reduction von Coss, Brian E., Loh, Wei-Yip, Oh, Jungwoo, Smith, Greg, Smith, Casey, Adhikari, Hemant, Sassman, Barry, Parthasarathy, Srivatsan, Barnett, Joel, Majhi, Prashant, Wallace, Robert M., Kim, Jiyoung, Jammy, Raj

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Reduction of Residual C and N-Related Impurities by Al2O3 Insertion in Atomic-Layer-Deposited La2O3 Thin Films von Joo Park, Tae, Sivasubramani, Prasanna, Coss, Brian E., Lee, Bongki, Wallace, Robert M., Kim, Jiyoung, Rousseau, Mike, Liu, Xinye, Li, Huazhi, Lehn, Jean-Sebastien, Hong, Daewon, Shenai, Deo

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Resting energy expenditure and nitrogen balance in critically ill pediatric patients on mechanical ventilation von Coss-Bu, Jorge A., Jefferson, Larry S., Walding, David, David, Yadin, Smith, E.O.’Brian, Klish, William J.

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High Mobility SiGe Channel NonPlanar Devices von Hobbs, Christopher, Smith, Casey, Adhikari, Hemant, Lin, ShengHao, Ok, Injo, Akarvardar, Kerem, Lee, Se-Hoon, Coss, Brian, Young, Chadwin, Cruz, Melvin, Majhi, Prashant, Jammy, Raj

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RESTING ENERGY EXPENDITURE (REE) IN MECHANICALLY VENTILATED (MV) PEDIATRIC PATIENTS: EVALUATION OF HARRIS-BENEDICT (HB) AND TALBOT (TA) PREDICTIONS COMPARED TO MEASURED INDIRECT CA... von Coss-Bu, Jorge, Jefferson, Larry, Klish, William, Walding, David, David, Yadin, Smith, E. O??Brian

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High mobility SiGe shell-Si core omega gate pFETS von Adhikari, H., Harris, H.R., Smith, C.E., Ji-Woon Yang, Coss, B., Parthasarathy, S., Bich-Yen Nguyen, Patruno, P., Krishnamohan, T., Cayrefourcq, I., Majhi, P., Jammy, R.

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MORPHOLINE TACHYKININ RECEPTOR ANTAGONISTS von SHAH, SHRENIK K, HARRISON, TIMOTHY, MAC COSS, MALCOLM, LADDUWAHETTY, TAMARA, CHAMBERS, MARK STUART, FINKE, PAUL E, WILLIAMS, BRIAN JOHN HARLOW, DORN, CONRAD P, MILLS, SANDER G, HALE, JEFFREY J

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