On the Development of 1700V SiC JBS Diodes in a 6-Inch Foundry von Sung, Woong Je, Gorczyca, Thomas, Dunn, Shannon, Yun, Nick, Collison, Wen Li, Valente, Sean, Liu, Eric, Bialy, Alexander, Prudhomme, Jamie, Hedrick, Jeffrey, Larrea, Anne Sophie, Franca, Daniel, Hung, Pui Yee, Sapp, Brian

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A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments von Kushner, Mark J., Collison, Wenli Z., Grapperhaus, Michael J., Holland, John P., Barnes, Michael S.

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HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy von Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K., Collison, Wenli Z., Ni, Tom Q.

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Ion drag effects in inductively coupled plasmas for etching von Collison, Wenli Z., Kushner, Mark J.

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Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control von El Chemali, Chadi, Freudenberg, Jim, Hankinson, Matt, Collison, Wenli, Ni, Tom

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A SYSTEM AND METHOD FOR CONTROLLING PLASMA WITH AN ADJUSTABLE COUPLING TO GROUND CIRCUIT von NI, Tuqiang, COLLISON, Wenli

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System and method for controlling plasma with an adjustable coupling to ground circuit von NI TUQIANG, COLLISON WENLI

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System and Method for Controlling Plasma With an Adjustable Coupling to Ground Circuit von NI TUQIANG, COLLISON WENLI

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System and method for controlling plasma with an adjustable coupling to ground circuit von NI TUQIANG, COLLISON WENLI

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Conceptual design of advanced inductively coupled plasma etching tools using computer modeling von Collison, W.Z., Kushner, M.J.

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Methods for detecting the endpoint of a photoresist stripping process von Ni, Tuqiang, Collison, Wenli

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System and method for controlling plasma with an adjustable coupling to ground circuit von Ni, Tuqiang, Collison, Wenli

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METHOD AND APPARATUS FOR DETECTING THE ENDPOINT OF A PHOTORESIST STRIPPING PROCESS von COLLISON, WENLI, NI, TUQIANG

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Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same von Ni, Tuqiang, Collison, Wenli, Hemker, David, Li, Lumin

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Apparatus for detecting the endpoint of a photoresist stripping process von Ni, Tuqiang, Collison, Wenli

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Method of an apparatus for obtaining neutral dissociated gas atoms von Ni, Tuqiang, Collison, Wenli

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BEHANDLUNGSKAMMER MIT EINEM OPTISCHEN FENSTER, DAS MIT BEHANDLUNGSGAS GEREINIGT IST von COLLISON, WENLI, NI, TUQUIANG

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PLASMA PROCESSOR WITH COIL HAVING VARIABLE RF COUPLING von COLLISON, WENLI, NI, TUQIANG, HOLLAND, JOHN, P

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ELEVATED STATIONARY UNIFORMITY RING von COLLISON, WENLI, NI, TUQIANG

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PROCESSING CHAMBER WITH OPTICAL WINDOW CLEANED USING PROCESS GAS von COLLISON, WENLI, NI, TUQUIANG

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