300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition von Clerix, J.J., Warad, L., Hung, J., Hody, H., Van Roey, F., Lorusso, G., Koret, R., Lee, W.T., Shah, K., Delabie, A.

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300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition von Clerix, J.J, Warad, L, Hung, J, Hody, H, Van Roey, F, Lorusso, G, Koret, R, Lee, W.T, Shah, K, Delabie, A

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Structural Phases of Alkanethiolate Self-Assembled Monolayers (C1-12) on Cu[100] by Density Functional Theory von Clerix, J.J, Sanz-Matias, A, Armini, S, Harvey, J.N, Delabie, A

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