Direct observation of the M2 phase with its Mott transition in a VO2 film von Kim, Hoon, Slusar, Tetiana V., Wulferding, Dirk, Yang, Ilkyu, Cho, Jin-Cheol, Lee, Minkyung, Choi, Hee Cheul, Jeong, Yoon Hee, Kim, Hyun-Tak, Kim, Jeehoon

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Control of the initial growth in atomic layer deposition of Pt films by surface pretreatment von Pyeon, Jung Joon, Cho, Cheol Jin, Baek, Seung-Hyub, Kang, Chong-Yun, Kim, Jin-Sang, Jeong, Doo Seok, Kim, Seong Keun

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Mott transition in chain structure of strained VO2 films revealed by coherent phonons von Slusar, Tetiana V., Cho, Jin-Cheol, Lee, Hyang-Rok, Kim, Ji-Wan, Yoo, Seung Jo, Bigot, Jean-Yves, Yee, Ki-Ju, Kim, Hyun-Tak

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MoO2 as a thermally stable oxide electrode for dynamic random-access memory capacitors von Lee, Woongkyu, Cho, Cheol Jin, Lee, Woo Chul, Hwang, Cheol Seong, Chang, Robert P. H, Kim, Seong Keun

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Epitaxial growth of higher transition-temperature VO2 films on AlN/Si von Slusar, Tetiana, Cho, Jin-Cheol, Kim, Bong-Jun, Yun, Sun Jin, Kim, Hyun-Tak

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Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas von An, Cheol Hyun, Jeon, Woojin, Kim, Sang Hyeon, Cho, Cheol Jin, Kwon, Dae Seon, Kim, Dong Gun, Lee, Woongkyu, Hwang, Cheol Seong

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Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition von An, Cheol Hyun, Lee, Woongkyu, Kim, Sang Hyeon, Cho, Cheol Jin, Kim, Dong‐Gun, Kwon, Dae Seon, Cho, Seong Tak, Cha, Soon Hyung, Lim, Jun Il, Jeon, Woojin, Hwang, Cheol Seong

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A Ru-Pt alloy electrode to suppress leakage currents of dynamic random-access memory capacitors von Pyeon, Jung Joon, Cho, Cheol Jin, Jeong, Doo Seok, Kim, Jin-Sang, Kang, Chong-Yun, Kim, Seong Keun

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SnO2 thin films grown by atomic layer deposition using a novel Sn precursor von Choi, Min-Jung, Cho, Cheol Jin, Kim, Kwang-Chon, Pyeon, Jung Joon, Park, Hyung-Ho, Kim, Hyo-Suk, Han, Jeong Hwan, Kim, Chang Gyoun, Chung, Taek-Mo, Park, Tae Joo, Kwon, Beomjin, Jeong, Doo Seok, Baek, Seung-Hyub, Kang, Chong-Yun, Kim, Jin-Sang, Kim, Seong Keun

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Correct extraction of frequency dispersion in accumulation capacitance in InGaAs metal-insulator-semiconductor devices von Lee, Woo Chul, Cho, Cheol Jin, Choi, Jung-Hae, Song, Jin Dong, Hwang, Cheol Seong, Kim, Seong Keun

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Atomic layer deposition of Ta-doped SnO2 films with enhanced dopant distribution for thermally stable capacitor electrode applications von Cho, Cheol Jin, Pyeon, Jung Joon, Hwang, Cheol Seong, Kim, Jin-Sang, Kim, Seong Keun

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Development of Dispersion Process to Improve Quality of Hyaluronic Acid Filler Crosslinked with 1,4-Butanediol Diglycidyl Ether von Choi, Sunglim, Cho, Jin Cheol, Lee, Seunghwa, Lee, Seong Jin

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Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO 4 Precursor and N 2 /H 2 Mixed Gas von An, Cheol Hyun, Jeon, Woojin, Kim, Sang Hyeon, Cho, Cheol Jin, Kwon, Dae Seon, Kim, Dong Gun, Lee, Woongkyu, Hwang, Cheol Seong

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Interface Engineering for Extremely Large Grains in Explosively Crystallized TiO2 Films Grown by Low-Temperature Atomic Layer Deposition von Cho, Cheol Jin, Kang, Jun-Yun, Lee, Woo Chul, Baek, Seung-Hyub, Kim, Jin-Sang, Hwang, Cheol Seong, Kim, Seong Keun

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Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film von Jeon, Woojin, Yoo, Sijung, Kim, Hyo Kyeom, Lee, Woongkyu, An, Cheol Hyun, Chung, Min Jung, Cho, Cheol Jin, Kim, Seong Keun, Hwang, Cheol Seong

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MoO 2 as a thermally stable oxide electrode for dynamic random-access memory capacitors von Lee, Woongkyu, Cho, Cheol Jin, Lee, Woo Chul, Hwang, Cheol Seong, Chang, Robert P. H., Kim, Seong Keun

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Ta-Doped SnO2 as a reduction-resistant oxide electrode for DRAM capacitors von Cho, Cheol Jin, Noh, Myoung-Sub, Lee, Woo Chul, An, Cheol Hyun, Kang, Chong-Yun, Hwang, Cheol Seong, Kim, Seong Keun

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Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O3 as Oxygen Sources von Lee, Woo Chul, Cho, Cheol Jin, Kim, Sangtae, Larsen, Eric S, Yum, Jung Hwan, Bielawski, Christopher W, Hwang, Cheol Seong, Kim, Seong Keun

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Interface Engineering for Extremely Large Grains in Explosively Crystallized TiO 2 Films Grown by Low-Temperature Atomic Layer Deposition von Cho, Cheol Jin, Kang, Jun-Yun, Lee, Woo Chul, Baek, Seung-Hyub, Kim, Jin-Sang, Hwang, Cheol Seong, Kim, Seong Keun

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Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H 2 O and O 3 as Oxygen Sources von Lee, Woo Chul, Cho, Cheol Jin, Kim, Sangtae, Larsen, Eric S., Yum, Jung Hwan, Bielawski, Christopher W., Hwang, Cheol Seong, Kim, Seong Keun

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