Nanoscale selective area epitaxy: towards lithographically defined quantum dots at 1.5 /spl mu/m using direct lithographic patterning von Swint, R.B., Juodawlkis, P.W., Oakley, D.C., Napoleone, A., Vineis, C.J., Chludzinski, J.W., Turner, G.W., Twichell, J.C., Bloomstein, T.M., Cann, S.G., Efremow, N.N., Hardy, D.E., Marchant, M.F., Rothschild, M.

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