Noninvasive Assessment of Spontaneous Baroreflex Sensitivity and Heart Rate Variability in Patients with Carotid Stenosis von Chao, A.C., Chern, C.M., Kuo, T.B., Chou, C.H., Chuang, Y.M., Wong, W.J., Hu, H.H.

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Polycystic kidney disease is a risk factor for new-onset diabetes after transplantation von HAMER, Rizwan A, CHOW, Chern L, ONG, Albert C. M, MCKANE, William S

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Retrospective study of the success rates and complications associated with total laparoscopic hysterectomy von Ng, Christopher C. M., Chern, Bernard S. M., Siow, Anthony Y. M.

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Autosomal dominant polycystic kidney disease von Chow, Chern Li, Ong, Albert CM

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ArF-line high transmittance attenuated phase shift mask blanks using amorphous Al2O3-ZrO2-SiO2 composite thin films for the 65-, 45- and 32-nm technology nodes von LAI, Fu-Der, HUA, Jui-Ming, HUANG, C. Y, KO, Fu-Hsiang, WANG, L. A, LIN, C. H, CHANG, C. M, LEE, S, CHERN, Gia-Wei

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ArF-line high transmittance attenuated phase shift mask blanks using amorphous Al 2O 3–ZrO 2–SiO 2 composite thin films for the 65-, 45- and 32-nm technology nodes von Lai, Fu-Der, Hua, Jui-Ming, Huang, C.Y., Ko, Fu-Hsiang, Wang, L.A., Lin, C.H., Chang, C.M., Lee, S., Chern, Gia-Wei

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Kinetics of curing reaction of urethane function on base-catalyzed epoxy reaction von Han, J. L., Chern, Y. C., Hsieh, K. H., Chiu, W. Y., Ma, C. C. M.

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Interpenetrating polymer networks of polyurethane and epoxy von CHERN, Y. C, HSIEH, K. H, MA, C. C. M, GONG, Y. G

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Growth and characterization of Cd1-x-yZnxMnyTe crystals von CHOU, W. C, CHEN, F. R, CHIANG, T. Y, SHIN, H. Y, SUN, C. Y, LIN, C. M, CHERN-YU, K, TSAI, C. T, CHUU, D. S

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Growth and characterization of Cd 1 − x − yZn xMn yTe crystals von Chou, W.C., Chen, F.R., Chiang, T.Y., Shin, H.Y., Sun, C.Y., Lin, C.M., Chern-Yu, K., Tsai, C.T., Chuu, D.S.

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The integration of proton bombardment process into the manufacturing of mixed-signal/RF chips von Tang, D.D., Lin, W.C., Lai, L.S., Wang, C.H., Lee, L.P., Hsu, H.M., Wu, C.M., Chang, C.W., Lien, W.Y., Chao, C.P., Lee, C.Y., Chern, G.J., Guo, J.C., Chang, C.S., Sun, Y.C., Du, D.S., Lan, K.C., Lin, L.F.

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A 90 nm CMOS MS/RF based foundry SOC technology comprising superb 185 GHz f/sub T/ RFMOS and versatile, high-Q passive components for cost/performance optimization von Chen, C.H., Chang, C.S., Chao, C.P., Kuan, J.F., Chang, C.L., Wang, S.H., Hsu, H.M., Lien, W.Y., Tsai, Y.C., Lin, H.C., Wu, C.C., Huang, C.F., Chen, S.M., Tseng, P.M., Chen, C.W., Ku, C.C., Lin, T.Y., Chang, C.F., Lin, H.J., Tsai, M.R., Chen, S., Chen, C.F., Wei, M.Y., Wang, Y.J., Lin, J.C.H., Chen, W.M., Chang, C.C., King, M.C., Huang, C.M., Lin, C.T., Guo, J.C., Chern, G.J., Tang, D.D., Sun, J.Y.C.

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Interpenetrating polymer networks of polyurethanes and epoxy resin, II. Compatibility and morphology von Hsieh, K. H., Chiang, Y. C., Chern, Y. C., Chiu, W. Y., Ma, C. C. M.

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Interpenetrating polymer networks of polyurethanes and epoxy resin, I. Mechanical behavior von Hsieh, K. H., Chiang, Y. C., Chern, Y. C., Chiu, W. Y., Ma, C. C. M.

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