Atomic layer deposition for rutile structure TiO2 thin films using a SnO2 seed layer and low temperature heat treatment von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Cheon, Seonghak, Byun, Younghun, Jeon, Hyeongtag

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Atomic layer deposition for rutile structure TiO 2 thin films using a SnO 2 seed layer and low temperature heat treatment von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Cheon, Seonghak, Byun, Younghun, Jeon, Hyeongtag

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Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursor von Baek, Ji-hoon, Choi, Wan-ho, Kim, Hohoon, Cheon, Seonghak, Byun, Younghun, Jeon, Woojin, Park, Jin-Seong

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The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films von Kim, Byunguk, Kang, Taeseong, Song, Seokhwi, Jung, Chanwon, Lee, Jungho, Cheon, SeongHak, Jeon, Hyeongtag

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Atomic layer deposition for rutile structure TiO2thin films using a SnO2seed layer and low temperature heat treatment von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Cheon, Seonghak, Byun, Younghun, Jeon, Hyeongtag

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Atomic layer deposition for rutile structure TiO 2 thin films using a SnO 2 seed layer and low temperature heat treatment von Kim, Byunguk, Choi, Yeonsik, Lee, Dahyun, Cheon, Seonghak, Byun, Younghun, Jeon, Hyeongtag

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