Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography von Ng, Philip C. W, Chien, Sheng-Wei, Chang, Bo-Sen, Tsai, Kuen-Yu, Lu, Yi-Chang, Li, Jia-Han, Chen, Alek C

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Optical scatterometry system for detecting specific line edge roughness of resist gratings subjected to detector noises von Lee, Yen-Min, Li, Jia-Han, Wang, Fu-Min, Cheng, Hsin-Hung, Shen, Yu-Tian, Tsai, Kuen-Yu, Shieh, Jason J, Chen, Alek C

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The Magnitude of Potential Exposure-Tool-Induced Critical Dimension and Overlay Errors in Double Dipole Lithography for the 65-nm and 45-nm Technology Nodes von Chiou, Tsann-Bim, Chen, Alek C., Tseng, Shih-En, Eurlings, Mark, Hendrickx, Eric, Hsu, Stephen

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Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography von Ng, Philip C. W., Chien, Sheng-Wei, Chang, Bo-Sen, Tsai, Kuen-Yu, Lu, Yi-Chang, Li, Jia-Han, Chen, Alek C.

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Substrate, method of exposing a substrate, machine readable medium von CHEN ALEK C

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Substrate, method of exposing a substrate, machine readable medium von CHEN ALEK C

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Substrate, method of exposing a substrate, machine readable medium von CHEN ALEK C

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Substrate, lithographic multiple exposure method, machine readable medium von CHEN ALEK C

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Substrate, method of exposing a substrate, machine readable medium von CHEN ALEK C

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In situ proximity gap monitor for lithography von Chen, Alek C

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In situ proximity gap monitor for lithography von CHEN ALEK C

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Lithographic apparatus and device manufacturing method von HANSEN STEVEN G, CHEN ALEK C

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Magnification correction for 1-X proximity X-Ray lithography von CHEN, ALEK C

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Intra-operative recordings of local field potentials can help localize the subthalamic nucleus in Parkinson's disease surgery von Chen, Chiung Chu, Pogosyan, Alek, Zrinzo, Ludvic U., Tisch, Stephen, Limousin, Patricia, Ashkan, Keyoumars, Yousry, Tarek, Hariz, Marwan I., Brown, Peter

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Value of subthalamic nucleus local field potentials recordings in predicting stimulation parameters for deep brain stimulation in Parkinson's disease von Yoshida, Fumiaki, Martinez-Torres, Irene, Pogosyan, Alek, Holl, Etienne, Petersen, Erika, Chen, Chiung Chu, Foltynie, Tom, Limousin, Patricia, Zrinzo, Ludvic U, Hariz, Marwan I, Brown, Peter

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Abstract PR-006: Spatially resolved, single cell assessment of pancreatic ductal adenocarcinoma expression subtypes reveals mixed and hybrid basal-classical marker expression with... von Williams, Hannah L., Zhang, Jinming, Raghavan, Srivatsan, Winter, Peter S., Kapner, Kevin, Vayrynen, Sara, Costa, Andressa Dias, Yuan, Chen, Lau, Mai Chan, Morales-Oyarvide, Vicente, Rubinson, Douglas, Brais, Lauren, Reilly, Emma, Kozak, Margaret, Linehan, David, Dunne, Richard, Chang, Daniel, Koong, Albert, Hezel, Aram, Hahn, William C., Shalek, Alek K., Aguirre, Andrew J., Nowak, Jonathan A., Wolpin, Brian M

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Gemini 1.5: Unlocking multimodal understanding across millions of tokens of context von Daruki, Samira, Gu, Yiming, Co-Reyes, J D, Mahdieh, Mahdis, Heng-Tze Cheng, Sundararajan, Mukund, Mentzer, Fabian, He, Antoine, Ho, Lewis, Chowdhery, Aakanksha, Petrushkina, Anastasia, Patil, Piyush, Zhao, Jeffrey, Rajwar, Ravi, Kar, Arjun, Ruoxin Sang, Hand, Steven, Jain, Vihan, Sethi, Nikhil, Bolina, Vijay, Levine, Nir, Addanki, Ravi, Lin, Hanzhao, Rutherford, Eliza, Choe, HyunJeong, Rakićević, Nemanja, Thanumalayan Sankaranarayana Pillai, Huang, Ronny, Chen, Jeremy, Skerry-Ryan, R J, Sulsky, Yury, Tom Le Paine, Greer, Jeremy, Chen, Charlie, Chen, Phil, Thacker, Phoebe, Davoodi, Elnaz, Golan Pundak, Khe Chai Sim, Proleev, Lev, Baddepudi, Anirudh, Tagliasacchi, Marco, Du, Cosmo, Hu, Clara Huiyi, Martins, Danilo, Shah, Premal, Feinberg, Vladimir, Smith, Charlotte, Shakeri, Siamak, Soparkar, Kedar, Barker, David, Houlsby, Neil, Magni, Alberto, Thakoor, Shantanu, Koop, Anna, Luke Vilnis, Zilka, Lukas, Cai, Honglong, Mukarram Tariq, Kallakuri, Praveen, Ghemawat, Sanjay, Tao, David, Green, Tim, Zhou, Denny, Broder, Josef, Repina, Alena, Burns, Andrea, Chu-Cheng, Lin, Ali Eslami, S M, Simon, Jon, Tenney, Ian, Chen, Minmin, Xu, Yaming, Thibault Sellam, Fernando, Nick, Singhal, Achintya, Crocker, Remi, Liu, Tianqi, White, Anais, McCarthy, Sara, McWilliams, Brian, Eisenbud, Danielle, Brovelli, Thomas, Mu, Jiaqi, Yew, Christopher, Paterson, Kim, Solomon, Kim, Pereira, Sebastien, Bingham, Garrett, Aharoni, Asaf, Lo, Jessica, Matthey, Loic, Jiang, Chong, Iqbal, Shariq, Chen, Zhe, Patraucean, Viorica, Tojo, Reiko, Ornduff, Tina, Folake Abu, Banica, Dan

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EUV lithography introduction at Chipmakers von Wagner, C, Bacelar, J, Harned, N, Loopstra, E, Hendriks, S, de Jong, I, Kuerz, P, Levasier, L, van de Kerkhof, M, Lowisch, M, Meiling, H, Ockwell, D, Peeters, R, van Setten, E, Stoeldraijer, J, Young, S, Zimmerman, J, Kool, R, Chen, A

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