A New High-Density Twin-Gate Isolation One-Time Programmable Memory Cell in Pure 28-nm CMOS Logic Process von Hsiao, Woan Yun, Peng, Ping Chun, Chang, Tzong-Sheng, Chih, Yu-Der, Tsai, Wu-Chin, Chang, Meng-Fan, Chien, Tun-Fei, King, Ya-Chin, Lin, Chrong-Jung

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High-Density FinFET One-Time Programmable Memory Cell With Intra-Fin-Cell-Isolation Technology von Peng, Ping Chun, Chen, Yu-Zheng, Hsiao, Woan Yun, Chen, Kuang-Hsin, Lin, Ching-Pin, Tien, Bor-Zen, Chang, Tzong-Sheng, Lin, Chrong Jung, King, Ya-Chin

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Characterization of Multilayer Metal Gate Fuse in 28-nm CMOS Logic Technology von HSIEH, Min-Che, LIN, Yu-Cheng, CHIN, Yung-Wen, CHANG, Tzong-Sheng, KING, Ya-Chin, LIN, Chrong-Jung

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The use of MASW method in the assessment of soil liquefaction potential von Lin, Chih-Ping, Chang, Cheng-Chou, Chang, Tzong-Sheng

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On-Chip Recovery Operation for Self-Aligned Nitride Logic Non-Volatile Memory Cells in High-K Metal Gate CMOS Technology von Lin, Po-Yen, Chiu, Yu-Lun, Sung, Yuh-Te, Chen, Jim, Chang, Tzong-Sheng, King, Ya-Chin, Lin, Chrong Jung

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Self-Rectifying Twin-Bit RRAM in 3-D Interweaved Cross-Point Array von Chen, Shu-En, Chin, Yung-Wen, Hsieh, Min-Che, Liao, Chu-Feng, Chang, Tzong-Sheng, Lin, Chrong-Jung, King, Ya-Chin

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Via Diode in Cu Backend Process for 3D Cross-Point RRAM Arrays von Liao, Yu-Cheng, Pan, Hsin-Wei, Hsieh, Min-Che, Chang, Tzong-Sheng, Chih, Yu-Der, Tsai, Ming-Jinn, Lin, Chrong Jung, King, Ya-Chin

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Multi-station analysis of surface wave dispersion von Lin, Chih-Ping, Chang, Tzong-Sheng

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Rapid thermal nitridation of titanium on Cu/Si contact system von Chang, Tzong-Sheng, Wang, Wen-Chun, Huang, Fon-Shan, Wang, Lih-Ping, Hwang, Jenn-Chang

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Study of tantalum-based diffusion barriers between Al and Si von Wang, Wen-Chun, Chang, Tzong-Sheng, Huang, Fon-Shan

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Diffusion barrier study on TaSix and TaSixNy von Wang, Wen-Chun, Chang, Tzong-Sheng, Huang, Fon-Shan, Chen, Jiann-Ruey

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Thermal stability study of TiN/TiSi2 diffusion barrier between Cu and n +Si von Chang, Tzong-Sheng, Wang, Wen-Chun, Wang, Lih-Ping, Hwang, Jenn-Chang, Huang, Fon-Shan

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Semiconductor structure with data storage structure and method for manufacturing the same von Hsiao, Woan-Yun, Chen, Huang-Kui, Chang, Tzong-Sheng, Lin, Chrong-Jung, King, Ya-Chin

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Method of fabricating reticle von Liao, Chi-Hung, Chung, Hsueh-Yi, Chen, Yung-Cheng, Fu, Shih-Chi, Chang, Tzong-Sheng, Hsu, Wei-Ti, Chuang, Jui-Ping, Tsai, Fei-Gwo, Chen, Kuei-Shun, Chen, Meng-Wei

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Methods for manufacturing semiconductor arrangements using photoresist masks von Chiang, Tsung-Yu, Kuang-Hsin, Chen, Tien, Bor-Zen, Chang, Tzong-Sheng

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SEMICONDUCTOR STRUCTURE HAVING DATA STORAGE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME von LIN CHRONG-JUNG, CHANG TZONG-SHENG, KING YAIN, CHEN HUANG-KUI, HSIAO WOAN-YUN

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SEMICONDUCTOR STRUCTURE WITH DATA STORAGE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME von HSIAO, Woan-Yun, LIN, Chrong-Jung, CHANG, Tzong-Sheng, KING, Ya-Chin, CHEN, Huang-Kui

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Semiconductor structure with data storage structure von Hsiao, Woan-Yun, Chen, Huang-Kui, Chang, Tzong-Sheng, Lin, Chrong-Jung, King, Ya-Chin

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Method for forming interconnect structure von Tien, Bor-Zen, Chen, Kuang-Hsin, Chang, Tzong-Sheng, Song, Jhu-Ming, Lin, Mu-Yi, Lin, Hsuan-Han

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MULTI-HEIGHT SEMICONDUCTOR STRUCTURES von CHANG, Tzong-Sheng, CHIANG, Tsung-Yu, TIEN, Bor-Zen, KUANG-HSIN, Chen

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