Low-temperature, high-growth-rate ALD of SiO2 using aminodisilane precursor von Nam, Taewook, Lee, Hyunho, Choi, Taejin, Seo, Seunggi, Yoon, Chang Mo, Choi, Yunjung, Jeong, Heonjong, Lingam, Hima K., Chitturi, Venkateswara R., Korolev, Andrey, Ahn, Jong-Hyun, Kim, Hyungjun

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The Impact of an Ultrathin Y2O3 Layer on GeO2 Passivation in Ge MOS Gate Stacks von Yujin Seo, Tae In Lee, Chang Mo Yoon, Bo-Eun Park, Wan Sik Hwang, Hyungjun Kim, Hyun-Yong Yu, Byung Jin Cho

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Very high frequency plasma reactant for atomic layer deposition von Oh, Il-Kwon, Yoo, Gilsang, Yoon, Chang Mo, Kim, Tae Hyung, Yeom, Geun Young, Kim, Kangsik, Lee, Zonghoon, Jung, Hanearl, Lee, Chang Wan, Kim, Hyungjun, Lee, Han-Bo-Ram

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Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications von Jeon, Yeon-Ji, Lee, Seung Won, Shin, Yoonchul, Kim, Ji Hwan, Yoon, Chang Mo, Ahn, Ji-Hoon

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항공기 날개 부분 단위구조체의 면 외 방향 물성 및 파손거동에 관한 연구 von 윤창모, Chang-mo Yoon, 이동우, Dong-woo Lee, 변준형, Joon-hyung Byun, 마이응우옌트란탄, Thanh Mai Nguyen Tran, 송정일, Jung-il Song

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Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al2O3 Nanopatterns von Seo, Seunggi, Yeo, Byung Chul, Han, Sang Soo, Yoon, Chang Mo, Yang, Joon Young, Yoon, Jonggeun, Yoo, Choongkeun, Kim, Ho-jin, Lee, Yong-baek, Lee, Su Jeong, Myoung, Jae-Min, Lee, Han-Bo-Ram, Kim, Woo-Hee, Oh, Il-Kwon, Kim, Hyungjun

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Effects of Ar Addition to O 2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films von Jung, Hanearl, Oh, Il-Kwon, Yoon, Chang Mo, Park, Bo-Eun, Lee, Sanghun, Kwon, Ohyung, Lee, Woo Jae, Kwon, Se-Hun, Kim, Woo-Hee, Kim, Hyungjun

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Effects of Ar Addition to O2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films von Jung, Hanearl, Oh, Il-Kwon, Yoon, Chang Mo, Park, Bo-Eun, Lee, Sanghun, Kwon, Ohyung, Lee, Woo Jae, Kwon, Se-Hun, Kim, Woo-Hee, Kim, Hyungjun

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Water-Erasable Memory Device for Security Applications Prepared by the Atomic Layer Deposition of GeO2 von Yoon, Chang Mo, Oh, Il-Kwon, Lee, Yujin, Song, Jeong-Gyu, Lee, Su Jeong, Myoung, Jae-Min, Kim, Hyun Gu, Moon, Hyoung-Seok, Shong, Bonggeun, Lee, Han-Bo-Ram, Kim, Hyungjun

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The Impact of an Ultrathin Y 2 O 3 Layer on GeO 2 Passivation in Ge MOS Gate Stacks von Seo, Yujin, Lee, Tae In, Yoon, Chang Mo, Park, Bo-Eun, Hwang, Wan Sik, Kim, Hyungjun, Yu, Hyun-Yong, Cho, Byung Jin

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Water-Erasable Memory Device for Security Applications Prepared by the Atomic Layer Deposition of GeO 2 von Yoon, Chang Mo, Oh, Il-Kwon, Lee, Yujin, Song, Jeong-Gyu, Lee, Su Jeong, Myoung, Jae-Min, Kim, Hyun Gu, Moon, Hyoung-Seok, Shong, Bonggeun, Lee, Han-Bo-Ram, Kim, Hyungjun

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Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al 2 O 3 Nanopatterns von Seo, Seunggi, Yeo, Byung Chul, Han, Sang Soo, Yoon, Chang Mo, Yang, Joon Young, Yoon, Jonggeun, Yoo, Choongkeun, Kim, Ho-Jin, Lee, Yong-Baek, Lee, Su Jeong, Myoung, Jae-Min, Lee, Han-Bo-Ram, Kim, Woo-Hee, Oh, Il-Kwon, Kim, Hyungjun

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The impact of atomic layer deposited SiO2 passivation for high-k Ta1−xZrxO on the InP substrateElectronic supplementary information (ESI) available. See DOI: 10.1039/c5tc01890k von Mahata, Chandreswar, Oh, Il-Kwon, Yoon, Chang Mo, Lee, Chang Wan, Seo, Jungmok, Algadi, Hassan, Sheen, Mi-Hyang, Kim, Young-Woon, Kim, Hyungjun, Lee, Taeyoon

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The impact of atomic layer deposited SiO sub(2) passivation for high-kTa sub(1-x)Zr sub(x)O on the InP substrate von Mahata, Chandreswar, Oh, Il-Kwon, Yoon, Chang Mo, Lee, Chang Wan, Seo, Jungmok, Algadi, Hassan, Sheen, Mi-Hyang, Kim, Young-Woon, Kim, Hyungjun, Lee, Taeyoon

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The impact of atomic layer deposited SiO 2 passivation for high-k Ta 1−x Zr x O on the InP substrate von Mahata, Chandreswar, Oh, Il-Kwon, Yoon, Chang Mo, Lee, Chang Wan, Seo, Jungmok, Algadi, Hassan, Sheen, Mi-Hyang, Kim, Young-Woon, Kim, Hyungjun, Lee, Taeyoon

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4 2 apparatus for synthesizing von YOON CHANG MO

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Enhanced refolding of lysozyme with imidazolium-based room temperature ionic liquids： Effect of hydrophobicity and sulfur residue von Bae, Sang-Woo, Chang, Woo-Jin, Koo, Yoon-Mo, Ha, Sung Ho

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PORTABLE OXYGEN GENERATOR von YOON, CHANG MO

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DIFFUSER FOR HORIZONTAL TYPE VAPOR DEPOSITION APPARATUS von YOON CHANG MO

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H H-TYPE CARBON STRUCTURE AND MANUFACTURING METHOD OF THE SAME von YOON CHANG MO, SONG JUNG IL, LEE DONG WOO

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