New materials of spin-on organic hardmask for sub-70 nm devices von Choi, Sang-Jun, Oh, Chang-Il, Uh, Dong-Seon

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Corporate social responsibility in international marketing: review, assessment, and future research von Eteokleous, Pantelitsa P, Leonidou, Leonidas C, Katsikeas, Constantine S

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Synthesis and Solubility Study of the Polyamides Containing 4,4'-(9- fluorenylidene)dianiline in the Backbone as an Antireflecting Spin-on Hardmask Materials von Irina Nam, Dong Seon Uh, Chang Il Oh, Jin Kuk Lee, Jae Min Oh, Jong Seob Kim

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Entering the base of the pyramid market in India: A corporate social entrepreneurship perspective von Tasavori, Misagh, Ghauri, Pervez N., Zaefarian, Reza

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Drivers and customer satisfaction outcomes of CSR in supply chains in different institutional contexts: A comparison between China and Taiwan von Jean, Ruey-Jer "Bryan", Wang, Zhiqiang, Zhao, Xiande, Sinkovics, Rudolf R.

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Corporate social responsibility as a marketing strategy in foreign markets: The case of Korean MNCs in the Chinese electronics market von Hadjikhani, Amjad, Lee, Joong Woo, Park, Sohee

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New materials of spin-on organic hardmask for sub-70nm devices von Choi, Sang-Jun, Oh, Chang-Il, Uh, Dong-Seon

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Effects of ethanol on insulin-like growth factor-Ⅰ system in primary cultured rat hepatocytes： Implications of JNK1/2 and alcoholdehydrogenase von Oh, Young-Il, Kim, Jong-Hoon, Kang, Chang-Won

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Absolute monocyte and lymphocyte count prognostic score for patients with gastric cancer von Eo, Wan Kyu, Jeong, Da Wun, Chang, Hye Jung, Won, Kyu Yeoun, Choi, Sung Il, Kim, Se Hyun, Chun, Sung Wook, Oh, Young Lim, Lee, Tae Hwa, Kim, Young Ok, Kim, Ki Hyung, Ji, Yong Il, Kim, Ari, Kim, Heung Yeol

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Antireflective hardmask composition and methods for using same von Uh, Dong Seon, Oh, Chang Il, Kim, Do Hyeon, Lee, Jin Kuk, Nam, Irina

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Antireflective hardmask composition and methods for using same von Uh, Dong Sun, Jung, Ji Young, Oh, Jae Min, Oh, Chang Il, Kim, Do Hyeon

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Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer von Yoon, Kyong Ho, Kim, Jong Seob, Uh, Dong Seon, Oh, Chang Il, Hyung, Kyung Hee, Kim, Min Soo, Lee, Jin Kuk

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Hardmask compositions for resist underlayer films von Uh, Dong Seon, Oh, Chang Il, Kim, Do Hyeon, Yun, Hui Chan, Lee, Jin Kuk, Nam, Irina, Kim, Jong Seob

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Resist remover composition von Baik, Ji-Hum, Oh, Chang-Il, Yoo, Chong-Soon

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Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same von Yoon, Kyong Ho, Kim, Jong Seob, Uh, Dong Seon, Cheon, Hwan Sung, Oh, Chang Il, Kim, Min Soo, Lee, Jin Kuk

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Resist remover composition von Baik, Ji-Hum, Oh, Chang-Il, Yoo, Chong-Soon

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Resist remover composition von Baik, Ji-Hum, Oh, Chang-Il, Soon Yoo, Chong

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Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer von Yoon, Kyong Ho, Kim, Jong Seob, Uh, Dong Seon, Oh, Chang Il, Hyung, Kyung Hee, Kim, Min Soo, Lee, Jin Kuk

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Resist remover composition von Baik, Ji-Hum, Oh, Chang-Il, Yoo, Chong-Soon

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Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same von Uh, Dong Seon, Oh, Chang Il, Kim, Do Hyeon, Yun, Hui Chan, Lee, Jin Kuk, Nam, Irina, Kim, Jong Seob

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