Photochemical atomic layer deposition and etching von Chalker, P.R.

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Single and triple insulator Metal-Insulator-Metal diodes for infrared rectennas von Tekin, S.B., Weerakkody, A.D., Sedghi, N., Hall, S., Werner, M., Wrench, J.S., Chalker, P.R., Mitrovic, I.Z.

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Enhanced low voltage nonlinearity in resonant tunneling metal–insulator–insulator–metal nanostructures von Weerakkody, A.D., Sedghi, N., Mitrovic, I.Z., van Zalinge, H., Nemr Noureddine, I., Hall, S., Wrench, J.S., Chalker, P.R., Phillips, L.J., Treharne, R., Durose, K.

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SrHfO3 Films Grown on Si(100) by Plasma-Assisted Atomic Layer Deposition von Black, K, Werner, M, Rowlands–Jones, R, Chalker, P.R, Rosseinsky, M.J

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Growth of dislocation-free GaN islands on Si(1 1 1) using a scandium nitride buffer layer von Moram, M.A., Kappers, M.J., Joyce, T.B., Chalker, P.R., Barber, Z.H., Humphreys, C.J.

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CuO/Ta₂O₅ core/shell nanoparticles produced by arc-discharge in water von Delaportas, D, Svarnas, P, Alexandrou, I, Georga, S.N, Krontiras, C.A, Xanthopoulos, N.I, Siokou, A, Chalker, P.R

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Microstructure of epitaxial scandium nitride films grown on silicon von Moram, M.A., Joyce, T.B., Chalker, P.R., Barber, Z.H., Humphreys, C.J.

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α-Ga2O3 grown by low temperature atomic layer deposition on sapphire von Roberts, J.W., Jarman, J.C., Johnstone, D.N., Midgley, P.A., Chalker, P.R., Oliver, R.A., Massabuau, F.C-P.

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Low temperature growth and optical properties of α-Ga2O3 deposited on sapphire by plasma enhanced atomic layer deposition von Roberts, J.W., Chalker, P.R., Ding, B., Oliver, R.A., Gibbon, J.T., Jones, L.A.H., Dhanak, V.R., Phillips, L.J., Major, J.D., Massabuau, F.C.-P.

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Structural and electrical investigation of MI2M and MI3M diodes for improved non-linear, low bias rectification von Nemr Noureddine, I., Sedghi, N., Wrench, J.S., Mitrovic, I.Z., Chalker, P.R., Hall, S.

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Microstructure and mechanical properties of Cu-modified AlSi10Mg fabricated by Laser-Powder Bed Fusion von Garmendia, X., Chalker, S., Bilton, M., Sutcliffe, C.J., Chalker, P.R.

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A review of the methods for the evaluation of coating-substrate adhesion von Chalker, P.R., Bull, S.J., Rickerby, D.S.

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Optical and electrical characterization of hafnium oxide deposited by liquid injection atomic layer deposition von Taechakumput, P., Taylor, S., Buiu, O., Potter, R.J., Chalker, P.R., Jones, A.C.

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Experimental band alignment of Ta2O5/GaN for MIS-HEMT applications von Sawangsri, K., Das, P., Supardan, S.N., Mitrovic, I.Z., Hall, S., Mahapatra, R., Chakraborty, A.K., Treharne, R., Gibbon, J., Dhanak, V.R., Durose, K., Chalker, P.R.

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Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films von Williams, P. A., Roberts, J. L., Jones, A. C., Chalker, P. R., Tobin, N. L., Bickley, J. F., Davies, H. O., Smith, L. M., Leedham, T. J.

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Extraction of the sub-band gap density of states of Nb doped ZnO thin film transistors using C-V measurements von Shaw, A., Jin, J.D., Mitrovic, I.Z., Hall, S., Wrench, J.S., Chalker, P.R.

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Embedded fibre Bragg grating sensors in advanced composite materials von Kuang, K.S.C., Kenny, R., Whelan, M.P., Cantwell, W.J., Chalker, P.R.

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Effect of deposition temperature on the properties of CeO2 films grown by atomic layer deposition von King, P.J., Werner, M., Chalker, P.R., Jones, A.C., Aspinall, H.C., Basca, J., Wrench, J.S., Black, K., Davies, H.O., Heys, P.N.

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Atomic-layer deposited thulium oxide as a passivation layer on germanium von Mitrovic, I. Z., Hall, S., Althobaiti, M., Hesp, D., Dhanak, V. R., Santoni, A., Weerakkody, A. D., Sedghi, N., Chalker, P. R., Henkel, C., Dentoni Litta, E., Hellström, P.-E., Östling, M., Tan, H., Schamm-Chardon, S.

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Hafnia and alumina on sulphur passivated germanium von Althobaiti, M., Mather, S., Sedghi, N., Dhanak, V.R., Mitrovic, I.Z., Hall, S., Chalker, P.R.

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