Growth of Silver Nanoparticles by DC Magnetron Sputtering von Asanithi, P., Patthanasettakul, V., Chaiyakun, S.

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Preparation and characterization of graphene oxide nanosheets von Rattana, Chaiyakun, S., Witit-anun, N., Nuntawong, N., Chindaudom, P., Oaew, S., Kedkeaw, C., Limsuwan, P.

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Structures, morphologies, and chemical states of sputter-deposited CrZrN thin films with various Zr contents von Chantharangsi, C., Denchitcharoen, S., Chaiyakun, S., Limsuwan, P.

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Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers von Phae-ngam, W., Horprathum, M., Chananonnawathorn, C., Lertvanithphol, T., Samransuksamer, B., Songsiriritthigul, P., Nakajima, H., Chaiyakun, S.

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Influence of sputtering power on structure and photocatalyst properties of DC magnetron sputtered TiO2 thin film von Pansila, P., Witit-anun, N., Chaiyakun, S.

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The effect of titanium current on structure and hardness of aluminium titanium nitride deposited by reactive unbalanced magnetron co-sputtering von Buranawong, A., Witit-anun, N., Chaiyakun, S., Pokaipisit, A., Limsuwan, P.

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Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Cosputtering von Patthanasettakul, V., Chaiyakun, S., Denchitcharoen, Somyod, Paksunchai, Chutima

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Variation of color in Zirconium nitride thin films prepared at high Ar flow rates with reactive dc magnetron sputtering von Klumdoung, P., Buranawong, A., Chaiyakun, S., Limsuwan, P.

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Structure and Surface Morphology of Cr-Zr-N Thin Films Deposited by Reactive DC Magnetron Sputtering von Chantharangsi, C., Denchitcharoen, S., Chaiyakun, S., Limsuwan, P.

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Characterization of Nanostructured TiZrN Thin Films Deposited by Reactive DC Magnetron Co-sputtering von Chinsakolthanakorn, S., Buranawong, A., Witit-anun, N., Chaiyakun, S., Limsuwan, P.

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Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering von Paksunchai, C., Denchitcharoen, S., Chaiyakun, S., Limsuwan, P.

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Influence of Annealing Temperature on Microstructural and Optical Properties of TiN Thin Films Deposited by DC Reactive Magnetron Sputtering von Chaiyakun, S., Witit-Anun, N., Rattana, T., Suwanboon, S.

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Structure and Composition of TiVN Thin Films Deposited by Reactive DC Magnetron Co-sputtering von Deeleard, T., Buranawong, A., Choeysuppaket, A., Witit-anun, N., Chaiyakun, S., Limsuwan, P.

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Influence of the Substrate Bias Voltage on the Structure of Rutile TiO2 Films Prepared by Dual Cathode DC Unbalanced Magnetron Sputtering von Witit-Anun, N., Kasemanankul, P., Chaiyakun, S., Limsuwan, P.

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Single Langmuir Probe Measurements in an Unbalanced Magnetron Sputtering System von Honglertkongsakul, K., Chaiyakun, S., Witit-anun, N., Kongsri, W., Limsuwan, P.

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Low-temperature deposition of (110) and (101) rutile TiO(2) thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite von Kasemanankul, P, Witit-Anan, N, Chaiyakun, S, Limsuwan, P, Boonamnuayvitaya, V

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States of Particles in DC Magnetron Sputtering Deposition of Titanium Metallic von Kongsri, W., Chaiyakun, S., Witit-Anun, N., Honglertkongsakul, K., Buranawong, A., Limsuwan, S., Limsuwan, P.

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The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering von Chaiyakun, Surasing, Witit-Anun, N., Deelert, T., Buranawong, A.

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Application of class D resonant inverter to titanium thin film sputtering on glass slide von Chaiyakun, Woratut, Liutanaku, P., Chaiyakun, S.

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Room temperature sputtered titanium oxynitride thin films: The influence of oxygen addition von Khwansungnoen, Phalakorn, Chaiyakun, Surasing, Rattana, Tanattha

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