Post thermal annealing crystallization and reactive ion etching of SiC films produced by PECVD von Oliveira, A.R., Carreño, M.N.P.

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Direct CVD graphene growth onto surgical stainless steel for orthopedic implants von Feria, D.J., de Almeida Filho, Saulo Afonso, Lopes, A.T., Saito, Mateus, Fernandes, Tiago Lazaretti, Carreño, M.N.P., Pereyra, I.

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PECVD-SiOxNy films for large area self-sustained grids applications von CARRENO, M. N. P, ALAYO, M. I, PEREYRA, I, LOPES, A. T

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Wide gap a-Si1-xCx: H thin films obtained under starving plasma deposition conditions von PEREYRA, I, CARRENO, M. N. P

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Wide optical band gap window layers for solar cells von Yu, Zhenrui, Pereyra, Ines, Carreno, M.N.P.

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Membranes of SiO xN y with 3D topography formed by PECVD for MEMS applications von Lopes, A.T., Carreño, M.N.P.

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PECVD a-Sic:H Young’s modulus obtained by MEMS resonant frequency von Rehder, G., Carreño, M.N.P.

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Thermally actuated a-SiC:H MEMS fabricated by a PECVD process von Rehder, G., Carreño, M.N.P.

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N and p-type doping of PECVD a-SiC:H obtained under “silane starving plasma” condition with and without hydrogen dilution von Oliveira, A.R., Carreño, M.N.P.

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Self-sustained bridges of a-SiC:H films obtained by PECVD at low temperatures for MEMS applications von Carreño, M.N.P., Lopes, A.T.

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p-Type doping in a-Si 1−xC x:H obtained by PECVD von Carreño, M.N.P., Pereyra, I.

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Membranes of SiOxNy with 3D topography formed by PECVD for MEMS applications von Lopes, A.T., Carreño, M.N.P.

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Fabrication of PECVD-silicon oxynitride-based optical waveguides von Alayo, M.I., Criado, D., Carreño, M.N.P., Pereyra, I.

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Amorphous and excimer laser annealed SiC films for TFT fabrication von García, B., Estrada, M., Albertin, K.F., Carreño, M.N.P., Pereyra, I., Resendiz, L.

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Structural and electrical properties of low-temperature PECVD SiC/c-Si heterostructures von Oliveira, A.R., Pereyra, I., Carreño, M.N.P.

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Mechanical properties of boron nitride thin films obtained by RF-PECVD at low temperatures von Vilcarromero, J, Carreño, M.N.P, Pereyra, I

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PECVD-SiO xN y films for large area self-sustained grids applications von Carreño, M.N.P, Alayo, M.I, Pereyra, I, Lopes, A.T

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Hydrogen effusion from highly-ordered near-stoichiometric a-SiC:H von Camargo, S.S., Carreño, M.N.P., Pereyra, I.

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Low temperature plasma enhanced chemical vapour deposition boron nitride von Carreño, M.N.P, Bottecchia, J.P, Pereyra, I

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Wide gap a-Si 1− xC x:H thin films obtained under starving plasma deposition conditions von Pereyra, I., Carreño, M.N.P.

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