Mechanisms of Oxygen Plasma Nanotexturing of Organic Polymer Surfaces: From Stable Super Hydrophilic to Super Hydrophobic Surfaces von Tsougeni, K, Vourdas, N, Tserepi, A, Gogolides, E, Cardinaud, C

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Experimental design approach for deposition optimization of RF sputtered chalcogenide thin films devoted to environmental optical sensors von Baudet, E., Sergent, M., Němec, P., Cardinaud, C., Rinnert, E., Michel, K., Jouany, L., Bureau, B., Nazabal, V.

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Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-base... von Meyer, T, Girard, A, Bouška, M, Baudet, E, Baillieul, M, Nĕmec, P, Nazabal, V, Cardinaud, C

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Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopies von Baudet, E., Cardinaud, C., Girard, A., Rinnert, E., Michel, K., Bureau, B., Nazabal, V.

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The role of physisorption in the cryogenic etching process of silicon von Antoun, G., Dussart, R., Tillocher, T., Lefaucheux, P., Cardinaud, C., Girard, A., Tahara, S., Yamazaki, K., Yatsuda, K., Faguet, J., Maekawa, K.

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Spectroscopic determination of the structure of amorphous nitrogenated carbon films von Bhattacharyya, Somnath, Cardinaud, C., Turban, G.

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Global model and diagnostic of a low-pressure SF6/Ar inductively coupled plasma von Lallement, L, Rhallabi, A, Cardinaud, C, Peignon-Fernandez, M C, Alves, L L

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Effect of doping on the modification of polycrystalline silicon by spontaneous reduction of diazonium salts von Girard, A., Coulon, N., Cardinaud, C., Mohammed-Brahim, T., Geneste, F.

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RF sputtered amorphous chalcogenide thin films for surface enhanced infrared absorption spectroscopy von Verger, F., Nazabal, V., Colas, F., Němec, P., Cardinaud, C., Baudet, E., Chahal, R., Rinnert, E., Boukerma, K., Peron, I., Deputier, S., Guilloux-Viry, M., Guin, J.P., Lhermite, H., Moreac, A., Compère, C., Bureau, B.

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SiGe derivatization by spontaneous reduction of aryl diazonium salts von Girard, A., Geneste, F., Coulon, N., Cardinaud, C., Mohammed-Brahim, T.

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Characterization of Plasma Etching Process Damage in HgCdTe von Gaucher, A., Baylet, J., Rothman, J., Martinez, E., Cardinaud, C.

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H atom surface loss kinetics in pulsed inductively coupled plasmas von Jacq, S, Cardinaud, C, Le Brizoual, L, Granier, A

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Quantitative Auger Electron Spectroscopic Analysis of Hg1−xCdxTe von Gaucher, A., Martinez, E., Baylet, J., Cardinaud, C.

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High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer: surface analyses and investigation of etch mechanisms von Eon, D, Raballand, V, Cartry, G, Cardinaud, C

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Effect of Cl2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy von Bouchoule, S., Vallier, L., Patriarche, G., Chevolleau, T., Cardinaud, C.

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Influence of Cadmium Composition on CH4–H2-Based Inductively Coupled Plasma Etching of Hg1−xCdxTe von Boulard, F., Baylet, J., Cardinaud, C.

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Ion energy distributions in a pulsed plasma doping system von Radovanov, S., Godet, L., Dorai, R., Fang, Z., Koo, B. W., Cardinaud, C., Cartry, G., Lenoble, D., Grouillet, A.

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Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy von Edon, V., Hugon, M.-C., Agius, B., Durand, O., Eypert, C., Cardinaud, C.

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Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6/Ar plasmas von Meyer, T., Girard, A., Le Dain, G., Rhallabi, A., Baudet, E., Nazabal, V., Němec, P., Cardinaud, C.

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Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O-2 plasmas von Meyer, T., LeDain, G., Girard, A., Rhallabi, A., Bouska, M., Nemec, P., Nazabal, Cardinaud, C.

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