State of the Art and Future Perspectives in Advanced CMOS Technology von Radamson, Henry H., Zhu, Huilong, Wu, Zhenhua, He, Xiaobin, Lin, Hongxiao, Liu, Jinbiao, Xiang, Jinjuan, Kong, Zhenzhen, Xiong, Wenjuan, Li, Junjie, Cui, Hushan, Gao, Jianfeng, Yang, Hong, Du, Yong, Xu, Buqing, Li, Ben, Zhao, Xuewei, Yu, Jiahan, Dong, Yan, Wang, Guilei

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Miniaturization of CMOS von Radamson, Henry H, He, Xiaobin, Zhang, Qingzhu, Liu, Jinbiao, Cui, Hushan, Xiang, Jinjuan, Kong, Zhenzhen, Xiong, Wenjuan, Li, Junjie, Gao, Jianfeng, Yang, Hong, Gu, Shihai, Zhao, Xuewei, Du, Yong, Yu, Jiahan, Wang, Guilei

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Investigation of the interface between LPCVD-SiNx gate dielectric and III-nitride for AlGaN/GaN MIS-HEMTs von Liu, Zhaoyang, Huang, Sen, Bao, Qilong, Wang, Xinhua, Wei, Ke, Jiang, Haojie, Cui, Hushan, Li, Junfeng, Zhao, Chao, Liu, Xinyu, Zhang, Jinhan, Zhou, Qi, Chen, Wanjun, Zhang, Bo, Jia, Lifang

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The Challenges of Advanced CMOS Process from 2D to 3D von Radamson, Henry, Zhang, Yanbo, He, Xiaobin, Cui, Hushan, Li, Junjie, Xiang, Jinjuan, Liu, Jinbiao, Gu, Shihai, Wang, Guilei

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Effect of hydrogen content on dielectric strength of the silicon nitride film deposited by ICP-CVD von Zhang, Yudong, Tang, Jiale, Hu, Yongjie, Yuan, Jie, Guan, Lulu, Li, Xingyu, Cui, Hushan, Ding, Guanghui, Shi, Xinying, Xu, Kaidong, Zhuang, Shiwei

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CMOS Scaling for the 5 nm Node and Beyond: Device, Process and Technology von Radamson, Henry H, Miao, Yuanhao, Zhou, Ziwei, Wu, Zhenhua, Kong, Zhenzhen, Gao, Jianfeng, Yang, Hong, Ren, Yuhui, Zhang, Yongkui, Shi, Jiangliu, Xiang, Jinjuan, Cui, Hushan, Lu, Bin, Li, Junjie, Liu, Jinbiao, Lin, Hongxiao, Xu, Haoqing, Li, Mengfan, Cao, Jiaji, He, Chuangqi, Duan, Xiangyan, Zhao, Xuewei, Su, Jiale, Du, Yong, Yu, Jiahan, Wu, Yuanyuan, Jiang, Miao, Liang, Di, Li, Ben, Dong, Yan, Wang, Guilei

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Impact of TaN as Wet Etch Stop Layer on Device Characteristics for Dual-Metal HKMG Last Integration CMOSFETs von Tang, Zhaoyun, Xu, Jing, Yang, Hong, Cui, Hushan, Tang, Bo, Xu, Yefeng, Wang, Hongli, Li, Junfeng, Yan, Jiang

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Planar Bulk MOSFETs With Self-Aligned Pocket Well to Improve Short-Channel Effects and Enhance Device Performance von Yanbo Zhang, Huilong Zhu, Hao Wu, Yongkui Zhang, Zhiguo Zhao, Jian Zhong, Hong Yang, Qingqing Liang, Dahai Wang, Junfeng Li, Cheng Jia, Jinbiao Liu, Yuyin Zhao, Chunlong Li, Lingkuan Meng, Peizhen Hong, Junjie Li, Qiang Xu, Jianfeng Gao, Xiaobin He, Yihong Lu, Yue Zhang, Tao Yang, Yao Wang, Hushan Cui, Chao Zhao, Huaxiang Yin, Huicai Zhong, Haizhou Yin, Jiang Yan, Wenwu Wang, Dapeng Chen, Hongyu Yu, Yang, Simon, Tianchun Ye

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Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET von Xiang, Jinjuan, Li, Tingting, Zhang, Yanbo, Wang, Xiaolei, Gao, Jianfeng, Cui, Hushan, Yin, Huaxiang, Li, Junfeng, Wang, Wenwu, Ding, Yuqiang, Xu, Chongying, Zhao, Chao

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Mitigation of Reverse Short-Channel Effect With Multilayer TiN/Ti/TiN Metal Gates in Gate Last PMOSFETs von Lichuan Zhao, Zhaoyun Tang, Bo Tang, Xueli Ma, Jinbiao Liu, Jinjuan Xiang, Jianfeng Gao, Chunlong Li, Xiaobin He, Cheng Jia, Mingzheng Ding, Hong Yang, Yefeng Xu, Jing Xu, Hongli Wang, Peng Liu, Peizhen Hong, Lingkuan Meng, Tingting Li, Wenjuan Xiong, Hao Wu, Junjie Li, Guilei Wang, Tao Yang, Hushan Cui, Yihong Lu, Xiaodong Tong, Jun Luo, Jian Zhong, Qiang Xu, Wenwu Wang, Junfeng Li, Huilong Zhu, Chao Zhao, Jiang Yan, Dapeng Chen, Yang, Simon, Tianchun Ye

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In-memory direct processing based on nanoscale perpendicular magnetic tunnel junctions von Cao, Kaihua, Cai, Wenlong, Liu, Yizheng, Li, Huisong, Wei, Jiaqi, Cui, Hushan, He, Xiaobin, Li, Junjie, Zhao, Chao, Zhao, Weisheng

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Characterization of D-lactate dehydrogenase in Leuconostoc citreum KM20 von WEN Yuping, LIU Jinxi, JIN Qing, CUI Hushan

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Characterization of Key Enzymes for D-lactic Acid Synthesis in Leuconostoc citreum KM20 von Liu, Jinxi, Piao, Hongjie, Liu, Changlei, Li, Guanyang, Cui, Hushan, Jin, Qing

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Low-Temperature Performance of Nanoscale Perpendicular Magnetic Tunnel Junctions With Double MgO-Interface Free Layer von Cao, Kaihua, Li, Huisong, Cai, Wenlong, Wei, Jiaqi, Wang, Lezhi, Hu, Yanpeng, Jiang, Qifeng, Cui, Hushan, Zhao, Chao, Zhao, Weisheng

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In-memory direct processing based on nanoscale perpendicular magnetic tunnel junctionsElectronic supplementary information (ESI) available. See DOI: 10.1039/c8nr05928d von Cao, Kaihua, Cai, Wenlong, Liu, Yizheng, Li, Huisong, Wei, Jiaqi, Cui, Hushan, He, Xiaobin, Li, Junjie, Zhao, Chao, Zhao, Weisheng

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Study of sigma-shaped source/drain recesses for embedded-SiGe pMOSFETs von Qin, Changliang, Yin, Huaxiang, Wang, Guilei, Hong, Peizhen, Ma, Xiaolong, Cui, Hushan, Lu, Yihong, Meng, Lingkuan, Yin, Haizhou, Zhong, Huicai, Yan, Jiang, Zhu, Huilong, Xu, Qiuxia, Li, Junfeng, Zhao, Chao, Radamson, Henry H.

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Novel metallization processes for sub-100 nm magnetic tunnel junction devices von Cao, Kaihua, Cui, Hushan, Zhang, Youguang, Xiong, Huagang, Wei, Jiaqi, Wang, Lezhi, Cai, Wenlong, Liu, Yizheng, Liu, Pan, He, Xiaobin, Li, Junjie, Bai, Guobin, Yu, Jiahan, Han, Jianghao, Gao, Jianfeng, Jiang, Qifeng, Hu, Yanpeng, Li, Lin, Tang, Bo, Zhang, Yue, Zhang, Peng, Zhang, Qihui, Liu, Shi, Lu, Yihong, Yang, Tao, Li, Junfeng, Radamson, Henry H., Zhao, Chao, Zhao, Weisheng

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An Encoder with Speed over 40Gbps for RC LDPC Codes with Rates Up to 0.96 von He, Zhiyong, Zhao, Qiang, Xu, Hushan, Cui, Wenjuan, Luo, Yuxi

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Process optimizations to recessed e-SiGe source/drain for performance enhancement in 22 nm all-last high-k/metal-gate pMOSFETs von Qin, Changliang, Wang, Guilei, Hong, Peizhen, Liu, Jinbiao, Yin, Huaxiang, Yin, Haizhou, Ma, Xiaolong, Cui, Hushan, Lu, Yihong, Meng, Lingkuan, Xiang, Jinjuan, Zhong, Huicai, Zhu, Huilong, Xu, Qiuxia, Li, Junfeng, Yan, Jian, Zhao, Chao, Radamson, Henry H.

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Heterogeneous Memristive Devices Enabled by Magnetic Tunnel Junction Nanopillars Surrounded by Resistive Silicon Switches von Zhang, Yu, Lin, Xiaoyang, Adam, Jean‐Paul, Agnus, Guillaume, Kang, Wang, Cai, Wenlong, Coudevylle, Jean‐Rene, Isac, Nathalie, Yang, Jianlei, Yang, Huaiwen, Cao, Kaihua, Cui, Hushan, Zhang, Deming, Zhang, Youguang, Zhao, Chao, Zhao, Weisheng, Ravelosona, Dafine

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