Measurement of Dipoles/Roll-Off /Work Functions by Coupling CV and IPE and Study of Their Dependence on Fabrication Process von Charbonnier, Matthieu, Leroux, Charles, Cosnier, V, Besson, P, Martinez, E, Benedetto, N, Licitra, Christophe, Rochat, Névine, Gaumer, C, Kaja, K, Ghibaudo, Gérard, Martin, François, Reimbold, Gilles

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Performance and reliability of advanced High-K/Metal gate stacks (Invited Paper) von Garros, X., Casse, M., Reimbold, G., Rafik, M., Martin, F., Andrieu, F., Cosnier, V., Boulanger, F.

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Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition von Tsai, W., Carter, R.J., Nohira, H., Caymax, M., Conard, T., Cosnier, V., DeGendt, S., Heyns, M., Petry, J., Richard, O., Vandervorst, W., Young, E., Zhao, C., Maes, J., Tuominen, M., Schulte, W.H., Garfunkel, E., Gustafsson, T.

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Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 “high k” and 2 metal deposition techniques von Cosnier, V., Besson, P., Loup, V., Vandroux, L., Minoret, S., Cassé, M., Garros, X., Pedini, J-M., Lhostis, S., Dabertrand, K., Morin, C., Wiemer, C., Perego, M., Fanciulli, M.

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HfO2–SiO2 interface in PVD coatings von Cosnier, V., Olivier, M., Théret, G., André, B.

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Tuning the dipole at the High-κ/SiO2 interface in advanced metal gate stacks von Charbonnier, M., Leroux, C., Cosnier, V., Besson, P., Martin, F., Ghibaudo, G., Reimbold, G.

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Tuning the dipole at the High-[kappa]/SiO@@d2@ interface in advanced metal gate stacks von Charbonnier, M, Leroux, C, Cosnier, V, Besson, P, Martin, F, Ghibaudo, G, Reimbold, G

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Measurement of Dipoles/Roll-Off /Work functions by coupling CV and IPE and study of their dependence on fabrication process von Charbonnier, M., Leroux, Cédric, Cosnier, V., Besson, P., Martinez, E., Benedetto, N., Licitra, C., Rochat, N., Gaumer, C., Kaja, K., Ghibaudo, G., Martin, F., Reimbold, G.

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Tuning the dipole at the High-/SiO2 interface in advanced metal gate stacks von Charbonnier, M., Leroux, Cédric, Cosnier, V., Besson, P., Martin, F., Ghibaudo, G., Reimbold, G.

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Tuning the dipole at the High-κ/SiO 2 interface in advanced metal gate stacks von Charbonnier, M., Leroux, C., Cosnier, V., Besson, P., Martin, F., Ghibaudo, G., Reimbold, G.

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Growth by Liquid-Injection MOCVD and Properties of HfO2 Films for Microelectronic Applications von Dubourdieu, C., Rauwel, E., Millon, C., Chaudouët, P., Ducroquet, F., Rochat, N., Rushworth, S., Cosnier, V.

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Guidelines to improve mobility performances and BTI reliability of advanced high-k/metal gate stacks von Garros, X., Casse, M., Reimbold, G., Martin, F., Leroux, C., Fanton, A., Renault, O., Cosnier, V., Boulanger, F.

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Interface chemical characterization of novel W∕HfO2∕GeON∕Ge stacks von Martinez, E., Renault, O., Clavelier, L., Le Royer, C., Hartmann, J.-M., Loup, V., Minoret, S., Cosnier, V., Campidelli, Y., Zegenhagen, J., Lee, T.-L.

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Effect of N2 annealing on AlZrO oxide von Pétry, J., Richard, O., Vandervorst, W., Conard, T., Chen, J., Cosnier, V.

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Effect of N 2 annealing on AlZrO oxide von Pétry, J., Richard, O., Vandervorst, W., Conard, T., Chen, J., Cosnier, V.

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Understanding of the thermal stability of the hafnium oxide/TiN stack via 2 "high k" and 2 metal deposition techniques von Cosnier, V., Besson, P., Loup, V., Vandroux, L., Minoret, S., Casse, M., Garros, X., Pedini, Jm, Lhostis, S., Dabertrand, K., Morin, Céline, Wiemer, C., Perego, M., Fanciulli, M.

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Growth by Liquid‐Injection MOCVD and Properties of HfO 2 Films for Microelectronic Applications von Dubourdieu, C., Rauwel, E., Millon, C., Chaudouët, P., Ducroquet, F., Rochat, N., Rushworth, S., Cosnier, V.

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Tuning the dipole at the High-k/SiO2 interface in advanced metal gate stacks von CHARBONNIER, M, LEROUX, C, COSNIER, V, BESSON, P, MARTIN, F, GHIBAUDO, G, REIMBOLD, G

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Reliable extraction of metal gate work function by combining two electrical characterization methods von Charbonnier, M., Mitard, J., Leroux, C., Ghibaudo, G., Cosnier, V., Besson, P., Martin, F., Reimbold, G.

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HfO 2 – SiO 2 interface in PVD coatings von Cosnier, V., Olivier, M., Théret, G., André, B.

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