Ionic Liquids:  Ion Mobilities, Glass Temperatures, and Fragilities von Xu, Wu, Cooper, Emanuel I, Angell, C. Austen

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Selective High-Throughput TiN Etching Methods von Rajaram, Rekha, Payne, Makonnen, Lippy, Steven, Cooper, Emanuel I.

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All-Wet, Metal-Compatible High-Dose-Implanted Photoresist Strip von To, Bang, Kern, Matthew, Totir, George G., van Berkel, Kim, Cooper, Emanuel I., Maurer, Siegfried, Nunes, Ronald, Payne, Makonnen, Dellaguardia, Ronald, Khojasteh, Mahmoud

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Enhancement of semiconductor wafer cleaning by chelating agent addition von GALE, Glenn W, RATH, David L, COOPER, Emanuel I, ESTES, Scott, OKORN-SCHMIDT, Harald F, BRIGANTE, Jeffrey, JAGANNATHAN, R, SETTEMBRE, Greg, ADAMS, Ed

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Wet Selective SiGe Etch to Enable Ge Nanowire Formation von Bilodeau, Steven, Witters, Liesbeth, Sebaai, Farid, Wostyn, Kurt, Rip, Jens, Lieten, Ruben R., Holsteyns, Frank, Yukifumi, Yoshida, Cooper, Emanuel

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Selective Etching of Silicon Oxide versus Nitride with Low Oxide Etching Rate von Tu, Sheng Hung, Wu, Hsing Chen, Yang, Min Chieh, Cooper, Emanuel

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Titanium Nitride Hard Mask Removal with Selectivity to Tungsten in FEOL von Tu, Sheng Hung, Wu, Hsing Chen, Yang, Min Chieh, Cooper, Emanuel

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High Throughput Wet Etch Solution for BEOL TiN Removal von Hsu, Chia Jung, Tu, Sheng Hung, Lippy, Steven, Wang, Chieh Ju, Payne, Makonnen, Cooper, Emanuel

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Industrial Challenges of TiN Hard Mask Wet Removal Process for 14nm Technology Node von Lippy, Steven, Zoll, Stephane, Buisine, Fabrice, Courouble, Kristell, Broussous, Lucile, Kennedy, Evelyn, Iwasaki, Akihisa, Ishikawa, Hidekazu, Cooper, Emanuel

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FORMULATIONS TO SELECTIVELY ETCH SILICON GERMANIUM RELATIVE TO GERMANIUM von COOPER, Emanuel I, BILODEAU, Steven

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FORMULATIONS TO SELECTIVELY ETCH SILICON GERMANIUM RELATIVE TO GERMANIUM von COOPER, Emanuel I, BILODEAU, Steven

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Selective Nitride Etch by Using Fluorides in High Boiling Point Solvent von Wu, Hsing Chen, Cooper, Emanuel I., Hsu, Heng Kai

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PROCESS FOR SELECTIVELY ETCHING P-DOPED POLYSILICON RELATIVE TO SILICON NITRIDE von COOPER, Emanuel I, BILODEAU, Steven

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Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility von Song, Lingyan, Cooper, Emanuel I, Lippy, Steven

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RUTHENIUM ETCHING COMPOSITION AND METHOD von COOPER, Emanuel I, LIPPY, Steven

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Ruthenium etching composition and method von Cooper, Emanuel I, Lippy, Steven

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RUTHENIUM ETCHING COMPOSITION AND METHOD von COOPER, Emanuel I, LIPPY, Steven

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RUTHENIUM ETCHING COMPOSITION AND METHOD von COOPER, Emanuel I, LIPPY, Steven

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COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING SILICON NITRIDE FILMS von WHITE, Daniela, BILODEAU, Steven M, COOPER, Emanuel I

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Composition and process for selectively etching p-doped polysilicon relative to silicon nitride von Bilodeau, Steven, Cooper, Emanuel I

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