Treffer 1 - 8 von 8 für Suche 'CIGAL JEAN CHARLES', Suchdauer: 0,54s Treffer weiter einschränken
  1. 1
    Wiring line formation, for e.g. dynamic RAM, involves forming amorphous carbon layer by depositing organosilicate glass on top of wiring lines so that edges of wiring lines are adjoined by air-filled spaces

    Wiring line formation, for e.g. dynamic RAM, involves forming amorphous carbon layer by depositing organosilicate glass on top of wiring lines so that edges of wiring lines are adj... von OFFENBERG, DIRK, SPERLICH, HANS-PETER, VOGT, MIRKO, CIGAL, JEAN CHARLES

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  2. 2
    Method of forming an electrical isolation associated with a wiring level on a semiconductor wafer

    Method of forming an electrical isolation associated with a wiring level on a semiconductor wafer von CIGAL JEAN CHARLES,OFFENBERG DIRK,SPERLICH HANS-PETER,VOGT MIRKO

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  3. 3
    Method for Structuring a Layered Stack

    Method for Structuring a Layered Stack von LAHNOR PETER, PETRI MARC, BAIER ULRICH, BECK MICHAEL, CZECH GUENTHER, WEBER DETLEF, CIGAL JEAN CHARLES

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  4. 4
    METHOD FOR FORMING ELECTRICAL ISOLATION RELATED TO WIRING LINES ARRANGED ON SEMICONDUCTOR WAFER

    METHOD FOR FORMING ELECTRICAL ISOLATION RELATED TO WIRING LINES ARRANGED ON SEMICONDUCTOR WAFER von VOGT MIRKO, OFFENBERG DIRK, SPERLICH HANS-PETER, CIGAL JEAN CHARLES

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  5. 5
    REACTOR BOX CHAMBER CLEANING USING MOLECULAR FLUORINE

    REACTOR BOX CHAMBER CLEANING USING MOLECULAR FLUORINE von PETRI STEFAN, KNIELING OLIVER, CIGAL JEAN CHARLES, STOCKMAN PAUL ALAN

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  6. 6
    CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE

    CHEMICAL VAPOR DEPOSITION CHAMBER CLEANING WITH MOLECULAR FLUORINE von PETRI STEFAN, HOGLE RICHARD, CIGAL JEAN CHARLES, HWANG YING SIANG, STOCKMAN PAUL ALAN

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  7. 7
    DEPOSITION CHAMBER CLEANING USING IN SITU ACTIVATION OF MOLECULAR FLUORINE

    DEPOSITION CHAMBER CLEANING USING IN SITU ACTIVATION OF MOLECULAR FLUORINE von PETRI STEFAN, CIGAL JEAN CHARLES, HWANG YING SIANG, STOCKMAN PAUL ALAN

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  8. 8
    Method of forming an electrical isolation associated with a wiring level on a semiconductor wafer

    Method of forming an electrical isolation associated with a wiring level on a semiconductor wafer von OFFENBERG, DIRK, SPERLICH, HANS-PETER, VOGT, MIRKO, CIGAL, JEAN CHARLES

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