High-Mobility CVD-Grown Ge/Strained Ge0.9Sn0.1/Ge Quantum-Well pMOSFETs on Si by Optimizing Ge Cap Thickness von Yu-Shiang Huang, Ya-Jui Tsou, Chih-Hsiung Huang, Chih-Hao Huang, Huang-Siang Lan, Chee Wee Liu, Yi-Chiau Huang, Hua Chung, Chorng-Ping Chang, Chu, Schubert S., Kuppurao, Satheesh

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Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition von Kim, Woo-Hee, Kim, Min-Kyu, Maeng, W. J., Gatineau, Julien, Pallem, Venkat, Dussarrat, Christian, Noori, Atif, Thompson, David, Chu, Schubert, Kim, Hyungjun

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Bulk n-channel MOSFETs with buried stressor at the 28 nm process node von Clifton, Paul, Goebel, Andreas, Kessler, Matthias, Majer, Martin, Knaeblein, Karsten, Hoentschel, Jan, Hemkar, Manish, Chu, Schubert, Moffatt, Steve

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Selective Epitaxial Si:P Film for nMOSFET Application: High Phosphorous Concentration and High Tensile Strain von Li, Xuebin, Dube, Abhishek, Ye, Zhiyuan, Sharma, Shashank, Kim, Yihwan, Chu, Schubert

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(Invited) Activation and Deactivation in Ultra-Highly Doped n-Type Epitaxy for nMOS Applications von Ye, Zhiyuan, Chen, Miao-Chun, Chang, Flora, Wu, Chen-Ying, Li, Xuebin, Dube, Abhishek, Liu, Patricia, Chopra, Saurabh, Chu, Schubert

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Buried SiGe as a performance booster in n-channel FDSOI MOSFETs von Clifton, Paul, Goebel, Andreas, Mulfinger, Robert, Child, Amy, Straub, Sherry, Sporer, Ryan, Carter, Rick, Kluth, Jon, Schaeffer, Jamie, Nguyen, Bich-Yen, Chabanne, Guillaume, Daval, Nicolas, Schwarzenbach, Walter, Hemkar, Manish, Chu, Schubert, Moffatt, Steve

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The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition von Oh, Il-kwon, Kim, Min-Kyu, Lee, Jae-seung, Lee, Chang-Wan, Lansalot-Matras, Clement, Noh, Wontae, Park, Jusang, Noori, Atif, Thompson, David, Chu, Schubert, Maeng, W.J., Kim, Hyungjun

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Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate von Maeng, Wan Joo, Oh, Il-Kwon, Kim, Woo-Hee, Kim, Min-Kyu, Lee, Chang-Wan, Lansalot-Matras, Clement, Thompson, David, Chu, Schubert, Kim, Hyungjun

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Significant Enhancement of the Dielectric Constant through the Doping of CeO 2 into HfO 2 by Atomic Layer Deposition von Kim, Woo‐Hee, Kim, Min‐Kyu, Oh, Il‐Kwon, Maeng, Wan Joo, Cheon, Taehoon, Kim, Soo‐Hyun, Noori, Atif, Thompson, David, Chu, Schubert, Kim, Hyungjun

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High-Mobility CVD-Grown Ge/Strained Ge 0.9 Sn 0.1 /Ge Quantum-Well pMOSFETs on Si by Optimizing Ge Cap Thickness von Huang, Yu-Shiang, Tsou, Ya-Jui, Huang, Chih-Hsiung, Huang, Chih-Hao, Lan, Huang-Siang, Liu, Chee Wee, Huang, Yi-Chiau, Chung, Hua, Chang, Chorng-Ping, Chu, Schubert S., Kuppurao, Satheesh

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Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition von Kim, Woo-Hee, Kim, Min-Kyu, Oh, Il-Kwon, Maeng, Wan Joo, Cheon, Taehoon, Kim, Soo-Hyun, Noori, Atif, Thompson, David, Chu, Schubert, Kim, Hyungjun

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Significant Enhancement of the Dielectric Constant through the Doping of CeO^sub 2^ into HfO^sub 2^ by Atomic Layer Deposition von Kim, Woo-Hee, Kim, Min-Kyu, Oh, Il-Kwon, Maeng, Wan Joo, Cheon, Taehoon, Kim, Soo-Hyun, Noori, Atif, Thompson, David, Chu, Schubert, Kim, Hyungjun

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Strain Relaxed Silicon Germanium Buffer Layers: From Growth to Integration Challenges von Dube, Abhishek, Huang, Yi-Chiau, Cherian, Benjamin, Nafisi, Kourosh, Chung, Hua, Chu, Schubert

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(Invited) Group IV Epitaxy Applications for Enabling Advanced Device Scaling von Colombeau, Benjamin P, Bauer, Matthias, Wood, Bingxi Sun, Chung, Hua, Hebb, Jeffrey, Huang, Yi-Chiau, Tao, Xianzhi, Chopra, Saurabh, Dube, Abhishek, Chudzik, Michael, Chu, Schubert

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METHOD OF FORMING AN RF SILICON ON INSULATOR DEVICE von ISHII, Masato, CHU, Schubert

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METHODS AND SYSTEMS FOR CLEANING HIGH ASPECT RATIO STRUCTURES von CHU, Schubert S, SANCHEZ, Errol Antonio C

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Methods and systems for cleaning high aspect ratio structures von C. Sanchez, Errol Antonio, Chu, Schubert S

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LAMP INFRARED RADIATION PROFILE CONTROL BY LAMP FILAMENT DESIGN AND POSITIONING von CHU, Schubert, CONG, Zhepeng

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Integrating Selective Epitaxy in Advanced Logic & Memory Devices von Kuppurao, Satheesh, Kim, Yihwan, Cho, Yonah, Chopra, Saurabh, Ye, Zhiyuan, Sanchez, Errol, Chu, Schubert

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METHODS AND SYSTEMS FOR CLEANING HIGH ASPECT RATIO STRUCTURES von CHU, Schubert S, SANCHEZ, Errol Antonio C

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