HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy von Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K., Collison, Wenli Z., Ni, Tom Q.

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Diode–Laser Measurements of He-, Ar-, and N2-Broadened HF Lineshapes in the First Overtone Band von Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K.

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Spectral Intensity and Lineshape Measurements in the First Overtone Band of HF Using Tunable Diode Lasers von Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K.

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High-Resolution Measurements of HBr Transitions in the First Overtone Band Using Tunable Diode Lasers von Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K.

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기판 프로세싱 시스템들의 강화된 차폐를 위한 넓은 커버리지 에지 링 von CHOU SHANG I, GRAGG GARY, GAJUDO GIOVANNI PAOLO, O'NEILL ROBERT G, WANG DANDAN

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WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESSING SYSTEMS von GAJUDO, Giovanni Paolo, GRAGG, Gary, CHOU, Shang-I, WANG, Dandan, O'NEILL, Robert G

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WIDE-COVERAGE EDGE RING FOR ENHANCED SHIELDING IN SUBSTRATE PROCESSING SYSTEMS von GAJUDO, Giovanni Paolo, GRAGG, Gary, CHOU, Shang-I, WANG, Dandan, O'NEILL, Robert G

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Diode laser absorption measurements of CH_3Cl and CH_4 near 165 µm von Chou, Shang-I, Baer, Douglas S., Hanson, Ronald K.

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OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICONDUCTOR SUBSTRATES von CHOU SHANG I, WANG YEN KUN VICTOR, AUGUSTINO JASON

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Method and apparatus of halogen removal using optimal ozone and UV exposure von Sant, Sanket, Chou, Shang-I

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Method and apparatus of halogen removal using optimal ozone and UV exposure von CHOU SHANG-I, SANT SANKET

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SYSTEM, METHOD AND APPARATUS FOR RF POWER COMPENSATION IN PLASMA ETCH CHAMBER von CHOU SHANG I, RAMACHANDRAN SEETHARAMAN, SATO ARTHUR, TONNIS ERIC, O'NEILL ROBERT G

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METHOD AND SYSTEM FOR CENTERING WAFER ON CHUCK von CHOU SHANG I, LUQUE JORGE, SINGH HARMEET, O'NEILL ROBERT GRIFFITH

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METHOD AND APPARATUS OF HALOGEN REMOVAL USING OPTIMAL OZONE AND UV EXPOSURE von CHOU SHANG-I, SANT SANKET

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Ozone plenum as uv shutter or tunable uv filter for cleaning semiconductor substrates von WANG YEN-KUN VICTOR, CHOU SHANG-I, AUGUSTINO JASON

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System, method and apparatus for RF power compensation in plasma etch chamber von Ramachandran Seetharaman, Chou Shang-I, O'Neill Robert G, Tonnis Eric, Sato Arthur

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METHOD AND APPARATUS OF HALOGEN REMOVAL von CHOU SHANG I, RAMACHANDRAN SEETHARAMAN, CASAES RAPHAEL, SANT SANKET, SINGH HARMEET, VAHEDI VAHID

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Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates von WANG YEN-KUN VICTOR, CHOU SHANG-I, AUTUSTINO JASON

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OZONE PLENUM AS UV SHUTTER OR TUNABLE UV FILTER FOR CLEANING SEMICONDUCTOR SUBSTRATES von WANG YEN-KUN VICTOR, CHOU SHANG-I, AUGUSTINO JASON

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Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates von WANG YEN-KUN VICTOR, CHOU SHANG-I, AUGUSTINO JASON

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