Effects of ring substituents on the protective properties of self-assembled benzenethiols on copper von Tan, Y.S., Srinivasan, M.P., Pehkonen, S.O., Chooi, Simon Y.M.

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Self-assembled organic thin films on electroplated copper for prevention of corrosion von Tan, Y. S., Srinivasan, M. P., Pehkonen, S. O., Chooi, Simon Y. M.

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Effect of a titanium cap in reducing interfacial oxides in the formation of nickel silicide von Tan, W. L., Pey, K. L., Chooi, Simon Y. M., Ye, J. H., Osipowicz, T.

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Optical resolutions and chelating properties of (.+-.)-[2-(methylsulfinyl)ethyl]diphenylarsine and its phosphorus analog von Chooi, Simon Y. M, Siah, Soh Yun, Leung, Pak Hing, Mok, K. F

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Corrosive Behavior of Tungsten in Post Dry-Etch Residue Remover von Chen, Bing-Hung, Zhang, Hao, Chooi, Chan, Lap, Xu, Y, Ye, J. H

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Stereochemical Investigation of Bis(bidentate)-Palladium(II) Complexes. Transmission of Ring Chiralities between Chelating Amine Ligands via Their Prochiral N-Methyl Substituents von Chooi, Simon Y. M, Tan, M. K, Leung, Pak-Hing, Mok, K. F

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Stereochemical investigations of coordinated sulfur stereocenters. X-ray structures of diastereomers of (-)589-[Pd{(R)-CH3CH(1-C10H6)NMe2-C2,N}(R/S)-{Ph2PCH2SMe-P,S}]PF6 von Chooi, Simon Y. M, Hor, T. S. Andy, Leung, Pak Hing, Mok, K. F

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Characterization of low- k dielectric trench surface cleaning after a fluorocarbon etch von Tan, Y.S., Chooi, Simon Y.M., Sin, Chian-Yuh, Ee, Ping-Yu, Srinivasan, M.P., Pehkonen, S.O.

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Post Polysilicon Etch (Incorporating DUV Resist an BARC) Polymer Cleaning von Chooi, Simon Y.M., Seah, B.-M., Zhou, Mei Sheng, Ee, Ping-Yu

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Occurrence of Arsenic-Based Defects and Techniques for Their Elimination von Chooi, Simon Y.M., Ismail, Zainab, Goh, Felicia, Sih, Vincent, Lim, Christopher

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Versatile chiral palladium(II) complexes for enantiomeric purities of 1,2-diamines von Chooi, Simon Y.M., Leung, Pak-hing, Chin Lim, Chin, Mok, K.F., Quek, G.H., Sim, K.Y., Tan, M.K.

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Angled XPS Analysis of Low-k Dielectric Surfaces after Cleaning von Chooi, Simon Y.M., Tan, Y.S., Pehkonen, Simo Olavi, Srinivasan, M.P., Ee, Ping-Yu, Sin, Chian-Yuh

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Cleaning after Contact Etching of Multi-Film Stack and Cobalt Disilicide: An XPS Study von Chooi, Simon Y.M., Ee, Ping-Yu, Liu, Wen Jun, Lim, Christopher

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Impacts of Buffer Oxide Layer in Nitride/Oxide Stack Gate Dielectrics on the Device Performance and Dielectric Reliability von Lin, W. H., Pey, K. L., Dong, Z., Lim, Victor S. K., Chooi, Simon Y. M., Zhou, M. S., Ang, C. H., Ang, T. C., Lau, W. S.

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Wet Oxide Etching of Dual Gate Oxide for 0.13μm Technologies and Beyond: Interaction with Photoresist and Equipment von Chooi, Simon Y.M., Ismail, Zainab, Loong, Sang-Yee, Tjoa, Tjin-Tjin, Lim, Christopher

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Process for predicting and reducing the corrosivity of a hydrocarbonaceous mixture von CHOOI SIMON YEW-MENG, CHIA LEE-HUAT

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Stereoelectronic effects on the chelating properties of [2-(methylsulfinyl)ethyl]diphenylarsine and its phosphorus analogue von Chooi, Simon Y.M., Ranford, John D., Leung, Pak-Hing, Mok, K.F.

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Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch von TAN, Y. S, CHOOI, Simon Y. M, SIN, Chian-Yuh, EE, Ping-Yu, SRINIVASAN, M. P, PEHKONEN, S. O

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Process for reducing the concentration of carboxylic acids von CHOOI, SIMON YEW-MENG, CHIA, LEE-HUAT

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In vitro cytotoxic properties of gold(I) and platinum(II) compounds containing asymmetric [2-(methylsulfinyl) ethyl]diphenylarsine and its phosphorus analogue von Chooi, Simon Y.M., Leung, Pak-Hing, Sim, K.Y., Tan, K.S., Kon, O.L.

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