Treffer 1 - 20 von 255 für Suche 'CHI KYEONG-KOO', Suchdauer: 0,99s Treffer weiter einschränken
  1. 1
    Resonant cavity modes of a bounded helicon discharge

    Resonant cavity modes of a bounded helicon discharge von Chi, Kyeong-Koo, Sheridan, T E, Boswell, R W


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  2. 2
    Self-starting threshold for additive pulse mode locking in Nd:YLF laser

    Self-starting threshold for additive pulse mode locking in Nd:YLF laser von Kyeong Koo Chi, Kyeong Koo Chi, Hong Jin Kong, Hong Jin Kong


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  3. 3
    SURFACE ANALYSIS FOR SELECTIVE SiO2 ETCHING BY REFLECTANCE PHOTOELASTIC MODULATED FOURIER TRANSFORM INFRARED SPECTROSCOPY

    SURFACE ANALYSIS FOR SELECTIVE SiO2 ETCHING BY REFLECTANCE PHOTOELASTIC MODULATED FOURIER TRANSFORM INFRARED SPECTROSCOPY von Doh, H-H, Chu, C, Chi, K-K, Moon, J-T


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  4. 4
    Characterization of m=−1 helicons

    Characterization of m=−1 helicons von Sheridan, T.E, Chi, Kyeong-Koo

    Veröffentlicht in Physics letters. A

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  5. 5
    Effect of carbon enrichment induced by photoresist on highly selective SiO2 etching

    Effect of carbon enrichment induced by photoresist on highly selective SiO2 etching von Chu, Changwoong, Chi, Kyeong-Koo, Moon, Joo-Tae


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  6. 6
    Characteristics of a stabilized pulsed plasma via suppression of side-band modes

    Characteristics of a stabilized pulsed plasma via suppression of side-band modes von Hahm, Jin Hwan, Chi, Kyeong Koo, Jung, Chan Ouk, Young Bum Koh, Young Bum Koh, Moon Yong Lee, Moon Yong Lee


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  7. 7
    Effects of conductivity of polysilicon on profile distortion

    Effects of conductivity of polysilicon on profile distortion von CHI, K. K, SHIN, H. S, YOO, W. J, JUNG, C. O, KOH, Y. B, LEE, M. Y


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  8. 8
    Effects of dynamic gain saturation on the self-starting condition for additive-pulse mode locking

    Effects of dynamic gain saturation on the self-starting condition for additive-pulse mode locking von Chi, Kyeong Koo, Kong, Hong Jin


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  9. 9
    Effect of carbon enrichment induced by photoresist on highly selective SiO 2 etching

    Effect of carbon enrichment induced by photoresist on highly selective SiO 2 etching von Chu, Changwoong, Chi, Kyeong-Koo, Moon, Joo-Tae


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  10. 10
    CD BIAS LOADING CONTROL WITH ARC LAYER OPEN

    CD BIAS LOADING CONTROL WITH ARC LAYER OPEN von CHI, KYEONG KOO, KIM JONATHAN

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  11. 11
    PROFILE CONTROL IN DIELECTRIC ETCH

    PROFILE CONTROL IN DIELECTRIC ETCH von CHI, KYEONG KOO, KIM JONATHAN

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  12. 12
    LINE WIDTH ROUGHNESS CONTROL WITH ARC LAYER OPEN

    LINE WIDTH ROUGHNESS CONTROL WITH ARC LAYER OPEN von CHI, KYEONG KOO, KIM JONATHAN

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  13. 13
    Profile control in dielectric etch

    Profile control in dielectric etch von CHI KYEONG-KOO, KIM JONATHAN

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  14. 14
    CD bias loading control with ARC layer open

    CD bias loading control with ARC layer open von CHI KYEONG-KOO, KIM JONATHAN

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  15. 15
    Surface Analysis for Selective SiO 2 Etching by Reflectance Photoelastic Modulated Fourier Transform Infrared Spectroscopy

    Surface Analysis for Selective SiO 2 Etching by Reflectance Photoelastic Modulated Fourier Transform Infrared Spectroscopy von Doh, Hyun-Ho, Chu, Changwoong, Chi, Kyeong-Koo, Moon, Joo-Tae


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  16. 16
    Ultra-high aspect ratio dielectric etch

    Ultra-high aspect ratio dielectric etch von CHI KYEONG-KOO, EDELBERG ERIK A

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  17. 17
    Sulfur and fluorine containing etch chemistry for improvement of distortion and bow control for har etch

    Sulfur and fluorine containing etch chemistry for improvement of distortion and bow control for har etch von Choi Sanghyuk, Vegh Joseph James, Chi Kyeong-Koo

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  18. 18
    SULFUR AND FLUORINE CONTAINING ETCH CHEMISTRY FOR IMPROVEMENT OF DISTORTION AND BOW CONTROL FOR HAR ETCH

    SULFUR AND FLUORINE CONTAINING ETCH CHEMISTRY FOR IMPROVEMENT OF DISTORTION AND BOW CONTROL FOR HAR ETCH von CHI Kyeong-Koo, CHOI Sanghyuk, VEGH Joseph James

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  19. 19
    Line width roughness control with arc layer open

    Line width roughness control with arc layer open von CHI KYEONG-KOO, KIM JONATHAN

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  20. 20
    Line width roughness control with arc layer open

    Line width roughness control with arc layer open von Chi, Kyeong-Koo, Kim, Jonathan

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