증기 침착 전구체 화합물 및 사용 방법 von CONDO ERIC, KUIPER DAVID, CHEN PHILIP S. H, BAUM THOMAS H, HENDRIX BRYAN C

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규소-함유 필름을 형성시키기 위한 규소 전구체 화합물 및 방법 von NGUYEN SHAWN D, PARK JAE EON, CHEN PHILIP S. H, LEE SOOJIN, KIM DAHYE, CHO SUNGSIL, HENDRIX BRYAN C

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ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THICKNESS BiTaO FILMS von JANG WOOSUNG, CHEN PHILIP S. H, GUO DINGKAI, LI WEIMIN, HENDRIX BRYAN C

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Chemical vapor deposition processes using ruthenium precursor and reducing gas von Baum, Thomas H, Hendrix, Bryan C, Chen, Philip S. H

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METHODS FOR SELECTIVE DEPOSITION OF PRECURSOR MATERIALS AND RELATED DEVICES von CHEN, Philip S. H, NGUYEN, Shawn Duc, HENDRIX, Bryan Clark

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METHODS FOR SELECTIVE DEPOSITION OF PRECURSOR MATERIALS AND RELATED DEVICES von Nguyen, Shawn Duc, Hendrix, Bryan Clark, Chen, Philip S. H

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Application of a downstream calorimetric probe to reactive plasma von Chen, Ing-Shin, Neuner, Jeffery W., Chen, Philip S. H., Welch, James J., DiMeo, Frank

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End-pointing chamber clean by calorimetric probing of process effluent von Chen, Ing-Shin, Neuner, Jeffrey W., Welch, James J., Chen, Philip S. H., DiMeo, Frank

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PROCESS FOR PREPARING SILICON-RICH SILICON NITRIDE FILMS von Nguyen, Shawn Duc, Hendrix, Bryan C, Chen, Philip S. H

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Micromachined chemical sensor with dual-transduction mechanisms von Chen, Ing-Shin, Stawasz, Michele, DiMascio, Susan K., Welch, James J., Neuner, Jeffrey W., Chen, Philip S. H., DiMeo, Frank

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VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE von KUIPER, David, CHEN, Philip S. H, HENDRIX, Bryan C, CONDO, Eric, BAUM, Thomas H

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CHEMICAL VAPOR DEPOSITION PROCESSES USING RUTHENIUM PRECURSOR AND REDUCING GAS von Baum, Thomas H, Hendrix, Bryan C, Chen, Philip S. H

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Chemical vapor deposition processes using ruthenium precursor and reducing gas von Baum, Thomas H, Hendrix, Bryan C, Chen, Philip S. H

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SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS von CHO, Sungsil, KIM, DaHye, CHEN, Philip S. H, HENDRIX, Bryan C, LEE, SooJin, PARK, Jae Eon, NGUYEN, Shawn D

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VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE von KUIPER, David, CHEN, Philip S. H, HENDRIX, Bryan C, CONDO, Eric, BAUM, Thomas H

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METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS von Baum, Thomas H, Wang, Han, Hendrix, Bryan C, Chen, Philip S. H, Nguyen, Shawn D, Wright, JR., Robert

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Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using same von DIMEO FRANK,CHEN PHILIP S. H.,CHEN ING-SHIN,NEUNER JEFFREY W.,WELCH JAMES

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Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor von Baum, Thomas H, Hendrix, Bryan C, Meng, Shuang, Chen, Philip S. H, Wright, Jr., Robert

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Methods for depositing tungsten or molybdenum films von Baum, Thomas H, Wang, Han, Hendrix, Bryan C, Chen, Philip S. H, Nguyen, Shawn D, Wright, Jr., Robert

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Vapor deposition precursor compounds and process of use von Baum, Thomas H, Kuiper, David, Condo, Eric, Hendrix, Bryan C, Chen, Philip S. H

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