Manufacturability of chemical vapor deposition of copper von NGUYEN, T, CHARNESKI, L. J, SHENG TENG HSU

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Chemical vapor deposition of copper thin films using new organometallic precursors with alkoxysilylolefin ligands von SENZAKI, Y, KOBAYASHI, M, CHARNESKI, L. J, NGUYEN, T

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Temperature dependence of the morphology of copper sputter deposited on TiN coated substrates von NGUYEN, T, CHARNESKI, L. J, EVANS, D. R

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CVD copper thin film deposition by using (1-pentene)Cu(I)(hfac) von Zhuang, W.W., Charneski, L.J., Evans, D.R., Sheng Teng Hsu

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Unusual Wilms tumors: Case series von Fachin, C.G., Andrade, M.A.S., de Oliveira, L., Jamur, C.M., Passos, M.B.S.T., Charneski, B.L., Tsouristakis, A.I., Tognolo, C.M., Dias, A.I.B.S., Amarante, A.C., Wiederkehr, J.C., Agulham, M.A.

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This Week in Science von Stajic, Jelena, Stern, Peter, Hines, Pamela J., Balasubramani, Anand, Ash, Caroline, Ray, L. Bryan, Vignieri, Sacha, Alderton, Gemma, Wong, Wei, Charneski, Catherine A., Vinson, Valda, Kiberstis, Paula A., Kelly, Priscilla N., Lavine, Marc S., Rai, Tage S., Yeston, Jake

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This Week in Science von Wong, Wei, Ray, L. Bryan, Osborne, Ian S., Fogg, Christiana N., Kiberstis, Paula A., Ash, Caroline, Benson, Philippa J., Szuromi, Phil, Zahn, Laura M., Mao, Steve, Vignieri, Sacha, Stajic, Jelena, Lavine, Marc S., Charneski, Catherine A., Alderton, Gemma

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This Week in Science von Hines, Pamela J., Alderton, Gemma, Charneski, Catherine A., Osborne, Ian S., Funk, Michael A., Grocholski, Brent, Smith, H. Jesse, Benson, Philippa J., Yeston, Jake, Vignieri, Sacha, Wong, Wei, Hurtley, Stella M., Balasubramani, Anand, Smith, Keith T., Ray, L. Bryan

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METHOD OF FORMING PrxCa1-xMnO3 THIN FILM HAVING PrMnO3/CaMnO3 SUPERLATTICE STRUCTURE BY METAL-ORGANIC CHEMICAL VAPOR DEPOSITION von LI TINGKAI, LAWRENCE J CHARNESKI, HSU SHENG TENG

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Bipolar switching PCMO capacitor von LI TINGKAI, ZHUANG WEI-WEI, HSU SHENG TENG, CHARNESKI LAWRENCE J, EVANS DAVID R

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Method of forming PrxCa1-xMnO3 thin films having a PrMnO3/CaMnO3 super lattice structure using metalorganic chemical vapor deposition von LI TINGKAI, HSU SHENG TENG, CHARNESKI LAWRENCE J

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Bipolar switching PCMO capacitor von LI TINGKAI, ZHUANG WEI-WEI, CHARNESKI LAWRENCE J, HSU SHENG T, EVANS DAVID R

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System and method for forming a bipolar switching PCMO film von LI TINGKAI, ZHUANG WEI-WEI, HSU SHENG TENG, CHARNESKI LAWRENCE J, EVANS DAVID R

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Precursor solution and method for controlling the composition of MOCVD deposited PCMO von CHARNESKI, LAWRENCE J, LI, TING-KAI, ZHUANG, WEIWEI, EVANS, DAVID R, HSU, SHENG-TENG

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BUFFER LAYER FORMING METHOD FOR RRAM THIN FILM DEPOSITION von LI TINGKAI, LAWRENCE J CHARNESKI, ZHUANG WEI-WEI, HSU SHENG TENG, EVANS DAVID R

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Method of buffer layer formation for RRAM thin film deposition von LI TINGKAI, ZHUANG WEI-WEI, CHARNESKI LAWRENCE J, HSU SHENG T, EVANS DAVID R

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DEPOSITION METHOD OF GRADING PRXCA1-XMNO3 THIN FILMS BY METAL ORGANIC CHEMICAL VAPOR DEPOSITION METHOD von LI TINGKAI, LAWRENCE J CHARNESKI, ZHUANG WEI-WEI, HSU SHENG TENG, EVANS DAVID R

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Grading PrxCa1-xMnO3 thin films by metalorganic chemical vapor deposition von LI TINGKAI, ZHUANG WEI-WEI, CHARNESKI LAWRENCE J, HSU SHENG T, EVANS DAVID R

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LOW-TEMPERATURE MOCVD PROCESSING FOR MANUFACTURING PrxCa1-xMnO3 THIN FILM von LI TINGKAI, LAWRENCE J CHARNESKI, ZHUANG WEI-WEI, HSU SHENG TENG, EVANS DAVID R

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System and method for forming a bipolar switching PCMO film von LI TINGKAI, ZHUANG WEI-WEI, CHARNESKI LAWRENCE J, HSU SHENG T, EVANS DAVID R

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