A Plasmonic Fiber Based Glucometer and Its Temperature Dependence von Kim, Jisoo, Son, Changjin, Choi, Sunjak, Yoon, Won Jung, Ju, Heongkyu

Volltext

Magnetic Control of Optical Reflectance from Metallic Thin Film Using Surface Plasmon Resonance and Faraday Rotation von Son, Changjin, Ju, Heongkyu

Volltext

Chemical modification of subcritical water for the dissolution of Si3N4 layer in the fabrication of microelectronic devices von Son, Changjin, Lee, Yuseok, Lim, Sangwoo

Volltext

Passivation of poly-Si surface using vinyl and epoxy group additives for selective Si3N4 etching in H3PO4 solution von Park, Taegun, Kim, Taehyeon, Son, Changjin, Lim, Sangwoo

Volltext

Selective Si 3 N 4 Etching in Si 3 N 4 /SiO 2 Pair-Layer Stack Using Non-H 3 PO 4 -Based Superheated Water von Son, Changjin, Lim, Sangwoo

Volltext

Selective Si3N4 Etching in Si3N4/SiO2 Pair-Layer Stack Using Non-H3PO4-Based Superheated Water von Son, Changjin, Lim, Sangwoo

Volltext

Addition of Carboxylic Acids to Superheated Water for the Environmentally Benign Removal of Silicon Nitrides von Son, Changjin, Park, Taegun, Lim, Sangwoo

Volltext

Oxide regrowth mechanism during silicon nitride etching in vertical 3D NAND structures von Kim, Taehyeon, Son, Changjin, Park, Taegun, Lim, Sangwoo

Volltext

Editors' Choice—Control of Si 3 N 4 Etching Kinetics and Selectivity to SiO 2 by the Additives in Superheated Water von Son, Changjin, Lim, Sangwoo

Volltext

Hexene passivation on a p-type Zn-doped InGaAs surface von Lee, Jinhoon, Na, Jihoon, Son, Changjin, Lim, Sangwoo

Volltext

Understanding of Si3N4-H3PO4 reaction chemistry for the control of Si3N4 dissolution kinetics von Park, Taegun, Son, Changjin, Kim, Taehyeon, Lim, Sangwoo

Volltext

Editors' Choice-Control of Si3N4 Etching Kinetics and Selectivity to SiO2 by the Additives in Superheated Water von Son, Changjin, Lim, Sangwoo

Volltext

Understanding of Etching Mechanism of Si 3 N 4 Film in H 3 PO 4 Solution For The Fabrication of 3D NAND Devices von Park, Taegun, Son, Changjin, Kim, Taehyeon, Lim, Sangwoo

Volltext

Si3N4 Etching with Carboxylic-Acid-Containing Superheated Water von Son, Changjin, Park, Taegun, Kim, Taehyeon, Lim, Sangwoo

Volltext

Understanding of Etching Mechanism of Si3N4 Film in H3PO4 Solution For The Fabrication of 3D NAND Devices von Park, Taegun, Son, Changjin, Kim, Taehyeon, Lim, Sangwoo

Volltext

Interfacial ZnS passivation for improvement of transparent ZnO/CuI diode characteristics von Kim, Taehyeon, Son, Changjin, Lee, Junwoo, Oh, Eunseok, Li, Shujie, Chang, Chih-Hung, Lim, Sangwoo

Volltext

Improvement of SiO2 surface morphology during the selective Si3N4 etching in the multi-layered 3D NAND Si3N4/SiO2 stack structures by the generation of CO2 gas through the control... von Kim, Taehyeon, Park, Taegun, Son, Changjin, Lim, Sangwoo

Volltext

Photon pairs bi-directionally emitted from a resonant metasurface von Son, Changjin, Sultanov, Vitaliy, Santiago-Cruz, Tomás, Anthur, Aravind P, Zhang, Haizhong, Paniagua-Dominguez, Ramon, Krivitsky, Leonid, Kuznetsov, Arseniy I, Chekhova, Maria V

Volltext

Kinetic Study on the Si3N4 Etching in Superheated Water von Lim, Sang Woo, Son, Changjin

Volltext

Kinetic Effect of Additives in High Temperature Phosphoric Acid on the Etching of Si3N4/SiO2 von Park, Taegun, Kim, Taehyeon, Son, Changjin, Lim, Sangwoo

Volltext