Treffer 1 - 20 von 128 für Suche 'CHANG, Juyeon', Suchdauer: 0,73s Treffer weiter einschränken
  1. 1
    Solvothermal Synthesis of Copper Indium Diselenide in Toluene

    Solvothermal Synthesis of Copper Indium Diselenide in Toluene von Chang, Ju-Yeon, Han, Jae-Eok, Jung, Duk-Young


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  2. 2
    Anthraquinone Sulfonate Modified, Layered Double Hydroxide Nanosheets for Dye-Sensitized Solar Cells

    Anthraquinone Sulfonate Modified, Layered Double Hydroxide Nanosheets for Dye-Sensitized Solar Cells von Lee, Jong Hyeon, Chang, Juyeon, Cha, Ji-Hyun, Jung, Duk-Young, Kim, Sung Soo, Kim, Ji Man

    Veröffentlicht in Chemistry : a European journal

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  3. 3
    Bimetallic nanoparticles of copper and indium by borohydride reduction

    Bimetallic nanoparticles of copper and indium by borohydride reduction von Chang, Juyeon, Lee, Jong Hyeon, Cha, Ji-Hyun, Jung, Duk-Young, Choi, Gwangbo, Kim, Guhyun

    Veröffentlicht in Thin solid films

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  4. 4
    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE

    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE von PETRO, Benjamin, CHANG, Juyeon, JOHNSON, Brittany

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  5. 5
    SELECTIVE NITRIDE SLURRIES WITH IMPROVED STABILITY AND IMPROVED POLISHING CHARACTERISTICS

    SELECTIVE NITRIDE SLURRIES WITH IMPROVED STABILITY AND IMPROVED POLISHING CHARACTERISTICS von CHANG, Juyeon, PANDEY, Prativa, REISS, Brian

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  6. 6
    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON

    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON von CHANG, Juyeon, REISS, Brian, JIN, Shengyu, HUANG, Helin

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  7. 7
    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON

    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON von CHANG, Juyeon, REISS, Brian, JIN, Shengyu, HUANG, Helin

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  8. 8
    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE

    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE von PETRO, Benjamin, CHANG, Juyeon, JOHNSON, Brittany

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  9. 9
    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON

    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON von CHANG, Juyeon, REISS, Brian, JIN, Shengyu, HUANG, Helin

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  10. 10
    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON

    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON von CHANG, Juyeon, REISS, Brian, JIN, Shengyu, HUANG, Helin

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  11. 11
    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON

    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON von CHANG, Juyeon, REISS, Brian, JIN, Shengyu, HUANG, Helin

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  12. 12
    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON

    CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON von Jin, Shengyu, Huang, Helin, Reiss, Brian, Chang, Juyeon

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  13. 13
    SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITY

    SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITY von NAIK, Sajo, KNAPTON, Elliot, CHANG, Juyeon, PALLIKKARA KUTTIATOOR, Sudeep, WANG, Jinfeng, WILLHOFF, Michael

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  14. 14
    Self-stopping polishing composition and method for high topological selectivity

    Self-stopping polishing composition and method for high topological selectivity von Willhoff, Michael, Knapton, Elliot, Pallikkara Kuttiatoor, Sudeep, Naik, Sajo, Chang, Juyeon, Wang, Jinfeng

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  15. 15
    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE

    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE von PETRO, Benjamin, CHANG, Juyeon, JOHNSON, Brittany

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  16. 16
    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE

    POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE von Johnson, Brittany, Chang, Juyeon, Petro, Benjamin

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  17. 17
    SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITY

    SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITY von NAIK, Sajo, KNAPTON, Elliot, CHANG, Juyeon, PALLIKKARA KUTTIATOOR, Sudeep, WANG, Jinfeng, WILLHOFF, Michael

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  18. 18
    SELF-STOPPING POLISHING COMPOSITION AND METHOD

    SELF-STOPPING POLISHING COMPOSITION AND METHOD von CHANG, Juyeon, BROSNAN, Sarah, JOHNSON, Brittany, HAINS, Alexander, W, WANG, Jinfeng

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  19. 19
    SELF-STOPPING POLISHING COMPOSITION AND METHOD

    SELF-STOPPING POLISHING COMPOSITION AND METHOD von CHANG, Juyeon, BROSNAN, Sarah, JOHNSON, Brittany, HAINS, Alexander, WANG, Jinfeng

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  20. 20
    SELECTIVE NITRIDE SLURRIES WITH IMPROVED STABILITY AND IMPROVED POLISHING CHARACTERISTICS

    SELECTIVE NITRIDE SLURRIES WITH IMPROVED STABILITY AND IMPROVED POLISHING CHARACTERISTICS von CHANG, Juyeon, PANDEY, Prativa, REISS, Brian

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