Evaluation of Size Distribution Measurement Methods for Sub-100 nm Colloidal Silica Nanoparticles and Its Application to CMP Slurry von Shin, Cheolmin, Choi, Jinhak, Kwak, Donggeon, Kim, Juhwan, Yang, Jichul, Chae, Seung-ki, Kim, Taesung

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Uniform deposition method of monodispersed SiO2 nanoparticles on a 300-mm Si wafer surface von Lee, Seungjae, Choi, Seulgi, Cho, Yujin, Oh, Haerim, Chae, Seung-Ki, Kim, Taesung

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Effect of Ceria Abrasive Synthesized by Supercritical Hydrothermal Method for Chemical Mechanical Planarization von Choi, Jinhak, Shin, Cheolmin, Yang, Jichul, Chae, Seung-Ki, Kim, Taesung

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Nonoxidative Aqueous Cleaning Solutions for Tungsten Layers von Park, Jung Dae, Kim, Se-Yeon, Lee, Da-Hee, Jun, Pil Kwon, Yi, Hun-Jung, Lee, Yang-Koo, Chae, Seung-Ki

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PAG Concentration Dependence of the Vertical Density Profile in Photoresist von Kim, Jae Hyun, Ahn, Sung II, Kim, Yong-ho, Yoon, Jin Goo, Zin, Wang-Cheol, Chae, Seung-Ki

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Study on Uniform Deposition on 300 mm Silicon Wafer with Sub-100 nm Sized Particles for Cleaning Application von Oh, Haerim, Chae, Seung Ki, Lee, Seungjae, Hong, Seokjun, Kim, Tae Sung

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Sizing Accuracy, Counting Efficiency, Lower Detection Limit and Repeatability of a Wafer Surface Scanner for Ideal and Real‐World Particles von Liu, Benjamin Y. H., Chae, Seung‐Ki, Bae, Gwi‐Nam

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Investigation of a Standard Particle Deposition System on Wafer Surface and Its Application to Wafer Cleaning von Cho, Younsun, Hong, Seokjun, Lee, Seungjae, Yang, Jichul, Chae, Seung-Ki, Kim, Taesung

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Novel Non-Oxidative Aqueous Cleaning Solutions for Tungsten Layers von Park, Jung Dae, Kim, Se-Yeon, Lee, Da-Hee, Jun, Pil K., Yi, Hun-Jung, Chae, Seung-Ki

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Evaluation of fine particle removal capability of multi inner stage cyclone von Lee, Sang-Jun, Kim, Dongbin, Chae, Seung Ki, Jeong, Kyung Hwan, Lee, Wonyoung, Bak, Moon Su, Kim, Hyeong-U, Kim, Taesung

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Determination of Refractive Indices of Dyed Polymer Monospheres von Chae, Seung-Ki, Lee, HaeOk Skarda

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Determination of Radiative Transport Properties of Particle Suspensions by a Single-Scattering Experiment von Chae, Seung-Ki, Lee, HaeOk Skarda

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The Highly Selective Wet Etching Process of SiO[sub 2] to TiSi[sub x] von Won Hwang, Dong, Kim, Kook Ju, Lee, Yang Ku, Chae, Seung Ki

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Influence of Particle Refractive Index on the Lower Detection Limit of Light Scattering Aerosol Counters von Yoo, Seong-Ho, Chae, Seung-Ki, Liu, Benjamin Y. H.

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08 I 02 Contaminant particle detection on semiconductor wafer surface by laser light scattering von Liu, Benjamin Y.H., Chae, Seung-Ki

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A Study on Germanium as a Contaminant Source in Semiconductor Fabrication Process von Jun, Pil Kwon, Chae, Seung Ki, Hwang, Dong Won, Lee, Jae Seok, Lee, Yang Ku

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Application of Aerodynamic Lenses to In Situ Particle Monitors (ISPM) for Higher Reliability in Semiconductor Fabrication Process von Chae, Seung Ki, Kim, Tae Sung

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Debris Flow in Metropolitan Area - 2011 Seoul Debris Flow von Yune, Chan-Young, Chae, Yun-Ki, Paik, Joongcheol, Kim, Gihong, Lee, Seung-Woo, Seo, Heung-Seok

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Development of New Batch-Type Plasma Assisted NOR (Native-Oxide-Removal) Dry Cleaning Equipment von Lee, Kwang Myung, Chae, Seung Ki, Kim, Wan Sik, Hwang, Wan Goo, Kim, Il-Kyoung, Yun, Ki-Young

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Laser cleaning of backside of wafer for photolithographic processing von Yi, Hun-Jung, Chae, Seung-Ki

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