Sensing the Charge State of Single Gold Nanoparticles via Work Function Measurements von Zhang, Yingjie, Pluchery, Olivier, Caillard, Louis, Lamic-Humblot, Anne-Félicie, Casale, Sandra, Chabal, Yves J, Salmeron, Miquel

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Visible to Near-Infrared Sensitization of Silicon Substrates via Energy Transfer from Proximal Nanocrystals: Further Insights for Hybrid Photovoltaics von Nimmo, Michael T, Caillard, Louis M, De Benedetti, William, Nguyen, Hue M, Seitz, Oliver, Gartstein, Yuri N, Chabal, Yves J, Malko, Anton V

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X-Ray Photoelectron Spectroscopy Estimation of Cobalt Seed Layer Reactivity Toward Air Exposure: A Challenge? von Etcheberry, Arnaud, Lakhdari, Amine, Caillard, Louis, Suhr, Dominique, Thiam, Mikailou, Raynal, Frederic, Simon, Nathalie, Gonçalves, Anne-Marie, Mevellec, Vincent, Frégnaux, Mathieu

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Efficient Directed Energy Transfer through Size-Gradient Nanocrystal Layers into Silicon Substrates von De Benedetti, William J. I., Nimmo, Michael T., Rupich, Sara M., Caillard, Louis M., Gartstein, Yuri N., Chabal, Yves J., Malko, Anton V.

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Gold Nanoparticles on Functionalized Silicon Substrate under Coulomb Blockade Regime: An Experimental and Theoretical Investigation von Pluchery, Olivier, Caillard, Louis, Dollfus, Philippe, Chabal, Yves J

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Investigation of Cu/TaN and Co/TaN Barrier-Seed Oxidation by Acidic and Alkaline Copper Electroplating Chemistry for Damascene Applications von Caillard, Louis, Vigneron, Jackie, Thiam, Mikailou, Lakhdari, Amine, Raynal, Frédéric, Etcheberry, Arnaud

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Grafted organic monolayer for single electron transport and for quantum dots solar cells von Caillard, Louis

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Nanoimaging of Organic Charge Retention Effects: Implications for Nonvolatile Memory, Neuromorphic Computing, and High Dielectric Breakdown Devices von Zhang, Yingjie, Kang, Jun, Pluchery, Olivier, Caillard, Louis, Chabal, Yves J, Wang, Lin-Wang, Sanz, Javier Fernandez, Salmeron, Miquel

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Gold Nanoparticles on Oxide-Free Silicon–Molecule Interface for Single Electron Transport von Caillard, Louis, Seitz, Oliver, Campbell, Philip M, Doherty, Rachel P, Lamic-Humblot, Anne-Félicie, Lacaze, Emmanuelle, Chabal, Yves J, Pluchery, Olivier

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Electrolyte and Deposition of a Copper Barrier Layer in a Damascene Process von Blondeau, Paul, Caillard, Louis

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ELECTROLYTE AND DEPOSITION OF A COPPER BARRIER LAYER IN A DAMASCENE PROCESS von BLONDEAU, Paul, CAILLARD, Louis

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ELECTROLYTE AND DEPOSITION OF A COPPER BARRIER LAYER IN A DAMASCENE PROCESS von BLONDEAU, Paul, CAILLARD, Louis

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METHOD OF METALLIZATION WITH A NICKEL OR COBALT ALLOY FOR THE MANUFACTURE OF SEMICONDUCTOR DEVICES von MEVELLEC, Vincent, CAILLARD, Louis, KIM, Yeeseul

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ELECTROLYTE AND METHOD FOR COPPER AND GRAPHENE ELECTRODEPOSITION von MEVELLEC, Vincent, CAILLARD, Louis, DOUSSOT, Céline Pascale

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ELECTROLYTE COMPRISING AN ACCELERATOR AGENT FOR BOTTOM-UP COPPER ELECTROPLATING von CAILLARD, Louis, KIM, Yeeseul, THIAM, Mikailou, BERTHON, Hermine

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다마신 공정에서 구리 배리어층의 전해질 및 증착 von CAILLARD LOUIS, BLONDEAU PAUL

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Process for electrodeposition of cobalt von Mevellec, Vincent, Thiam, Mikailou, Suhr, Dominique, Caillard, Louis

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Electrolyte and deposition of a copper barrier layer in a damascene process von BLONDEAU, PAUL, CAILLARD, LOUIS

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ELECTRODEPOSITION OF A COBALT OR COPPER ALLOY, AND USE IN MICROELECTRONICS von MEVELLEC, Vincent, CAILLARD, Louis, SUHR, Dominique, THIAM, Mikaïlou

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Electrolyte et dépôt d'une couche barrière au cuivre dans un procédé Damascène von BLONDEAU, Paul, CAILLARD, Louis

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