Metrology for the next generation of semiconductor devices von Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

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Development of transmon qubits solely from optical lithography on 300 mm wafers von Foroozani, N, Hobbs, C, Hung, C C, Olson, S, Ashworth, D, Holland, E, Malloy, M, Kearney, P, O'Brien, B, Bunday, B, DiPaola, D, Advocate, W, Murray, T, Hansen, P, Novak, S, Bennett, S, Rodgers, M, Baker-O'Neal, B, Sapp, B, Barth, E, Hedrick, J, Goldblatt, R, Rao, S S Papa, Osborn, K D

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Value-Added Metrology von Bunday, B., Allgair, J., Caldwell, M., Solecky, E., Archie, C., Rice, B., Singh, B., Cain, J., Emami, I.

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Machine interference problem with a random environment von Sztrik, J., Bunday, B.D.

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(Invited) Materials and Processes for Superconducting Qubits and Superconducting Electronic Circuits on 300mm Wafers von Papa Rao, Satyavolu S., Hobbs, Christopher, Olson, Stephen, Foroozani, Neda, Chong, Hyuncher, Stamper, Harlan, Martinick, Brian, Ashworth, Dominic, Bunday, Benjamin, Malloy, Matthew, Holland, Eric, Nalaskowski, Jakub, Kearney, Patrick, Ngai, Tat, Wells, Ilyssa, Yakimov, Michael, Oktyabrsky, Serge, O'Brien, Brendan, Kaushik, Vidya, Dunn, Kathleen A, Beckmann, Karsten, Bennett, Stephen, Rodgers, Martin, Murray, Thomas, Novak, Steven, Baker-O'Neal, Brett, Borst, Christopher, Osborn, Kevin D, Liehr, Michael

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Publisher Correction: Metrology for the next generation of semiconductor devices von Orji, N. G., Badaroglu, M., Barnes, B. M., Beitia, C., Bunday, B. D., Celano, U., Kline, R. J., Neisser, M., Obeng, Y., Vladar, A. E.

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Asymptotic analysis of the heterogeneous machine interference problem with random environments von Sztrik, J., Bunday, B.D.

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A new algorithm for the normal distribution function von Bunday, B. D., Bokhari, S. M. Husnain, Khan, K. H.

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X-ray reflectometry and x-ray fluorescence monitoring of the atomic layer deposition process for high- k gate dielectrics von Hung, P. Y., Gondran, Carolyn, Ghatak-Roy, Amiya, Terada, Shinichi, Bunday, Ben, Yeung, Henry, Diebold, Alain

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The efficiency of uni-directionally patrolled machines with two robot repairmen von Bunday, Brian D., Khorram, Esmaile

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The Future of CD Metrology von Allgair, J., Bunday, B.

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The G/M/ r machine interference model von Bunday, B.D., Scraton, R.E.

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The maintenance of unidirectionally patrolled stations von Bunday, Brian D., Tapsir, Ruzela

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The efficiency of unidirectionally patrolled machines von Bunday, Brian D., Khorram, Esmaile

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The efficiency of bi-directionally patrolled machines when repairs are not always successful von Bunday, B.D., El-Badri, W.K., Supanekar, S.D.

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Likelihood and Bayesian Estimation Methods for Poisson Process Models in Software Reliability von Bunday, B.D, Al-Ayoubi, I.D

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Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon von Wang, H., Laws, G. M., Milicic, S., Boland, P., Handugan, A., Pratt, M., Eschrich, T., Myhajlenko, S., Allgair, J. A., Bunday, B.

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The efficiency of M groups of N machines served by a travelling robot: comparison of two models von BUNDAY, B. D., EL-BADRI, W. K.

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Using the proportional hazards model to study heart valve replacement data von Bunday, B. D., Kiri, V. A., Stoodley, K. D. C.

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A closed form solution for the G/M/r machine interference model von BUNDAY, BRIAN D., KHORRAM, ESMAILE

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