Variation in volatile organic compounds in Atlantic salmon mucus is associated with resistance to salmon lice infection von Difford, G. F., Haugen, J.-E., Aslam, M. L., Johansen, L. H., Breiland, M. W., Hillestad, B., Baranski, M., Boison, S., Moghadam, H., Jacq, C.

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Probiotic Carnobacterium divergens increase growth parameters and disease resistance in farmed Atlantic cod (Gadus morhua) larvae without influencing the microbiota von Puvanendran, V., Rud, I., MSW, Breiland, Arnesen, J.A., Axelsson, L.

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Emissivity-correcting mid-infrared pyrometry for group-III nitride MOCVD temperature measurement and control von Creighton, J.R., Breiland, W.G., Koleske, D.D., Thaler, G., Crawford, M.H.

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Gas-phase nanoparticle formation during AlGaN metalorganic vapor phase epitaxy von Creighton, J. R., Breiland, W. G., Coltrin, M. E., Pawlowski, R. P.

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Reactive sticking coefficients for silane and disilane on polycrystalline silicon von BUSS, R. J, HO, P, BREILAND, W. G, COLTRIN, M. E

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A surface kinetics model for the growth of Si1-xGex films from SiH4/GeH4 mixtures von RUSSELL, N. M, BREILAND, W. G

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Organometallic vapor phase epitaxy (OMVPE) von Breiland, William G., Coltrin, Michael E., Creighton, J.Randall, Hou, Hong Q., Moffat, Harry K., Tsao, Jeffrey Y.

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Laser-Induced Fluorescence Measurements and Kinetic Analysis of Si Atom Formation in a Rotating Disk Chemical Vapor Deposition Reactor von Ho, Pauline, Coltrin, Michael E, Breiland, William G

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Highly uniform and reproducible vertical-cavity surface-emitting lasers grown by metalorganic vapor phase epitaxy with in situ reflectometry von Hou, H.Q., Chui, H.C., Choquette, K.D., Hammons, B.E., Breiland, W.G., Geib, K.M.

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Gas chromatography-mass spectroscopy study of tert-butylarsine stability and purification von Bartram, M.E, Breiland, W.G, Bruskas, L.A, Killeen, K.P

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Design and operating characteristics of a metalorganic vapor phase epitaxy production scale, vertical, high speed, rotating disk reactor von Tompa, G.S., Zawadzki, P.A., Moy, K., McKee, M., Thompson, A.G., Gurary, A.I., Wolak, E., Esherick, P., Breiland, W.G., Evans, G.H., Bulitka, N., Hennessy, J., Moore, C.J.L.

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Comparisons between a gas-phase model of silane chemical vapor deposition and laser-diagnostic measurements von Breiland, William G., Coltrin, Michael E., Ho, Pauline

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Nature of the parasitic chemistry during AlGaInN OMVPE. Fundamental kinetics determining growth rate profiles of InP and GaAs in MOCVD with horizontal reactor von Creighton, J R, Wang, G T, Breiland, W G, Coltrin, M E, Im, I-T, Oh, H J, Sugiyama, M, Nakano, Y, Shimogaki, Y

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High purity GaAs and AlGaAs grown using tertiarybutylarsine, trimethylaluminum, and trimethylgallium von Biefeld, R.M., Chui, H.C., Hammons, B.E., Breiland, W.G., Brennan, T.M., Jones, E.D., Kim, M.H., Grodzinski, P., Chang, K.H., Lee, H.C.

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Tertiarybutylarsine for metalorganic chemical vapor deposition growth of high purity, high uniformity films von CHUI, H. C, BIEFELD, R. M, LEE, H. C, HAMMONS, B. E, BREILAND, W. G, BRENNAN, T. M, JONES, E. D, MOFFAT, H. K, KIM, M. H, GRODZINSKI, P, CHANG, K. H

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Gas-phase silicon atoms in silane chemical vapor deposition: laser-excited fluorescence measurements and comparisons with model predictions von BREILAND, W. G, HO, P, COLTRIN, M. E

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Growth study of AlGaAs using dimethylethylamine alane as the aluminum precursor von Hou, H. Q., Breiland, W. G., Hammons, B. E., Biefeld, R. M., Baucom, K. C., Stall, R. A.

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Si deposition rates in a two-dimensional CVD reactor and comparisons with model calculations von BREILAND, W. G, COLTRIN, M. E

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Pulsed UV laser Raman spectroscopy of silane in a linear-flow chemical vapor deposition reactor von Breiland, W. G., Kushner, M. J.

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A surface kinetics model for the growth of Si1− x Ge x films from SiH4/GeH4 mixtures von Russell, N. M., Breiland, W. G.

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