The effect of argon plasma treatment on the permeation barrier properties of silicon nitride layers von Majee, S., Cerqueira, M.F., Tondelier, D., Geffroy, B., Bonnassieux, Y., Alpuim, P., Bourée, J.E.

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Effect of argon ion energy on the performance of silicon nitride multilayer permeation barriers grown by hot-wire CVD on polymers von Alpuim, P., Majee, S., Cerqueira, M.F., Tondelier, D., Geffroy, B., Bonnassieux, Y., Bourée, J.E.

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Permeation barrier performance of Hot Wire-CVD grown silicon-nitride films treated by argon plasma von Majee, S., Cerqueira, M.F., Tondelier, D., Vanel, J.C., Geffroy, B., Bonnassieux, Y., Alpuim, P., Bourée, J.E.

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Hydrogenated amorphous and nanocrystalline silicon solar cells deposited by HWCVD and RF-PECVD on plastic substrates at 150°C von Filonovich, S.A., Alpuim, P., Rebouta, L., Bourée, J.-E., Soro, Y.M.

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Growth of vertically aligned arrays of carbon nanotubes for high field emission von Kim, D., Lim, S.H., Guilley, A.J., Cojocaru, C.S., Bourée, J.E., Vila, L., Ryu, J.H., Park, K.C., Jang, J.

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Gas phase and surface kinetics in plasma and hot filament-enhanced catalytic chemical vapor deposition of carbon nanostructures von Le Normand, F., Gulas, M., Veis, P., Cojocaru, C.S., Bourée, J.E.

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Electron beam poling in amorphous Ge-doped H:SiO2 films von Liu, Q., Poumellec, B., Zhao, X., Girard, G., Bourée, J.-E., Kudlinski, A., Martinelli, G.

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Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD von Bourée, J.E., Guillet, J., Grattepain, C., Chaumont, J.

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Numerical study on the field emission properties of aligned carbon nanotubes using the hybrid field enhancement scheme von KIM, D, BOUREE, J. E, KIM, S. Y

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Amorphous silicon thin-film solar cells deposited on flexible substrates using different zinc oxide layers von Alpuim, P., Samantilleke, A., Marins, E., Oliveira, F., Cerqueira, M. F., Rebouta, L., Stefanov, S., Chiussi, S., Serra, C., Bourée, J.E.

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Correlated structural and electronic properties of microcrystalline silicon films deposited at low temperature by catalytic CVD von BOUREE, J. E

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High density plasma enhanced chemical vapor deposition of optical thin films von Daineka, D., Bulkin, P., Girard, G., Bourée, J.-E., Drévillon, B.

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Optical properties and local atomic order in non hydrogenated amorphous silicon carbonitride films von DOUCEY, B, CUNIOT, M, MOUDNI, R, TENEGAL, F, BOUREE, J. E, IMHOFF, D, ROMMELUERE, M, DIXMIER, J

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Deposition of silicon nitride thin films by hot-wire CVD at 100 °C and 250 °C von Alpuim, P., Gonçalves, L.M., Marins, E.S., Viseu, T.M.R., Ferdov, S., Bourée, J.E.

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Microcrystalline silicon films deposited by hot-wire CVD for solar cells on low-temperature substrate von Niikura, C, Brenot, R, Guillet, J, Bourée, J.E, Kleider, J.P, Brüggemann, R, Longeaud, C

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Growth mechanisms and structural properties of microcrystalline silicon films deposited by catalytic CVD von Niikura, C., Kim, S.Y., Drévillon, B., Poissant, Y., Roca i Cabarrocas, P., Bourée, J.E.

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Control and monitoring of optical thin films deposition in a Matrix Distributed Electron Cyclotron Resonance reactor von Daineka, D., Kouznetsov, D., Bulkin, P., Girard, G., Bourée, J.-E., Drévillon, B.

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Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor von Bulkin, P., Bourée, J.-E., Daineka, D., Girard, G.

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Synthesis of multi-walled carbon nanotubes by combining hot-wire and dc plasma-enhanced chemical vapor deposition von Sorin Cojocaru, Costel, Kim, Dohyung, Pribat, Didier, Bourée, Jean-Eric

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Interface phenomena in multilayers deposited by PECVD for encapsulation of lithium microbatteries von Ubrig, J, Martin, S, Cros, S, Bouree, J-E

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