Proximity correction simulations in ultra-high resolution x-ray lithography von Bourdillon, A J, Boothroyd, C B

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A critical condition in Fresnel diffraction used for ultra-high resolution lithographic printing von Bourdillon, A J, Boothroyd, C B, Kong, J R, Vladimirsky, Y

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Impact parameters and intraband scattering in electron diffraction from thin foils von Bourdillon, A J

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Displacement damage in supported YBa2Cu3O7-x thin films and finite-element simulations von Bourdillon, A J, Tan, N X

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Enhancement or reduction of catalytic dissolution reaction in chemically amplified resists by substrate contaminants von Choi Pheng Soo, Valiyaveettil, S., Huan, A., Wee, A., Ting Cheong Ang, Fan, M.H., Bourdillon, A.J., Lap Hung Chan

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Interband scattering of channelled electrons suffering high energy losses von Bourdillon, A. J.

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The Science of Science and Quasi-science von AJ, Bourdillon

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Near field x-ray lithography simulations for printing fine bridges von Bourdillon, Antony J, Boothroyd, Chris B, Williams, Gwyn P, Vladimirsky, Yuli

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Orientation anomalies in plating thickness measurements from advanced packaging substrates von Tan, N X, Lee, A J Y, Bourdillon, A J, Tan, C Y S

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Evaluation of silicon nitride and silicon carbide as efficient polysilicon grain-growth inhibitors von CHA, C. L, CHOR, E. F, JIA, Y. M, BOURDILLON, A. J, GONG, H, PAN, J. S, ZHANG, A. Q, TANG, S. K, BOOTHROYD, C. B

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Transmission electron microscopy observation of CMOS devices of titanium self-aligned silicide technology with nitrogen (N+) implantation process von JIA, Y. M, LIM, C. W, BOURDILLON, A. J, BOOTHROYD, C

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Analysis of coatings which inhibit epoxy bleeding in electronic packaging von Tan, N X, Lim, K H, H, Bourdillon, A J

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Hot isostatically pressed Bi2Sr2Ca2Cu3O10 coils made with novel precursors von BOURDILLON, A. J, TAN, N. X, ONG, C. L

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A study on the effect of incorporating nitrogen ions on titanium disilicide thin film formation for ULSI applications von LIM, C. W, BOURDILLON, A. J, GONG, H, LAHIRI, S. K, PEY, K. L, LEE, K. H

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Fine line structure in convergent-beam electron diffraction of icosahedral Al6Mn von Bourdillon, A. J.

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Use of the track structure approach in TEM von Bourdillon, Antony J

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The measurement of impact parameters by crystallographic orientation effects in electron scattering von Bourdillon, A. J.

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Continuous production of superconducting Y-Ba-Cu-O wire von TAN, N. X, BOURDILLON, A. J

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The charge state of titanium ions implanted into sapphire: an EXAFS investigation von BOURDILLON, A. J, BULL, S. J, BURNETT, P. J, PAGE, T. F

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Ionic energy levels and hole formation in high temperature superconductors von Bourdillon, A.J., Tan, N.X.

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