Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation von GOGOLIDES, E, BOUKOURAS, C, KOKKORIS, G, BRANI, O, TSEREPI, A, CONSTANTOUDIS, V

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Characteristics of W and Cu/W gate MOS diodes fabricated by a process utilizing LPCVD of W and Cu lift-off von Kouvatsos, D.N., Ioannou-Sougleridis, V., Tsevas, S., Christoforou, F., Davazoglou, D., Boukouras, C.

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Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation von Gogolides, E, Boukouras, C, Kokkoris, G, Brani, O, Tserepi, A, Constantoudis, V

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Si etching in high-density SF 6 plasmas for microfabrication: surface roughness formation von Gogolides, E., Boukouras, C., Kokkoris, G., Brani, O., Tserepi, A., Constantoudis, V.

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Multimodal Accessibility for Deaf Students Using Interactive Video, Digital Repository and Hybrid Books von Kourbetis, Vassilis, Boukouras, Konstantinos, Gelastopoulou, Maria

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Digital Accessibility in the Education of the Deaf in Greece von Kourbetis, Vassilis, Karipi, Spyridoula, Boukouras, Konstantinos

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