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  1. 1
    Measurement of charge storage and leakage in polyimides

    Measurement of charge storage and leakage in polyimides von Frederickson, A.R., Benson, C.E., Bockman, J.F.


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  2. 2
    A comparison of buried oxide characteristics of single and multiple implant SIMOX and bond and etch back wafers

    A comparison of buried oxide characteristics of single and multiple implant SIMOX and bond and etch back wafers von Annamalai, N.K., Bockman, J.F., McGruer, N.E., Chapski, J.


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