Defect trapping of ion-implanted deuterium in nickel von Besenbacher, F., Bo/ttiger, J., Myers, S. M.

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Trapping and surface permeation of deuterium in He-implanted Fe von Myers, S. M., Follstaedt, D. M., Besenbacher, F., Bo/ttiger, J.

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Deuterium in He-implanted Fe: Trapping and the surface permeation barrier von Myers, S. M., Besenbacher, F., Bo/ttiger, J.

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Trapping of hydrogen isotopes in molybdenum and niobium predamaged by ion implantation von Bo/ttiger, J., Picraux, S. T., Rud, N., Laursen, T.

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Implantation profiles of low-energy helium in niobium and the blistering mechanism von Behrisch, R., Bo/ttiger, J., Eckstein, W., Littmark, U., Roth, J., Scherzer, B. M. U.

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Profile studies of hydrogen trapping in metals due to ion damage von Picraux, S. T., Bo/ttiger, J., Rud, N.

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Interface stress in Au/Ni multilayers von Schweitz, K. O., Bo/ttiger, J., Chevallier, J., Feidenhans’l, R., Nielsen, M. M., Rasmussen, F. B.

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Deuterium trapping in helium-implanted nickel von Besenbacher, F., Bo/ttiger, J., Myers, S. M.

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Erratum: Deuterium in He-implanted Fe: Trapping and the surface permeation barrier [Appl. Phys. Lett. 3 9 , 450 (1981)] von Myers, S. M., Besenbacher, F., Bo/ttiger, J.

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Depth profiles of 3He ions implanted into solids at energies between 20 and 60 keV von Bo/ttiger, J., Jensen, P. S., Littmark, U.

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Ranges of 10–30-keV deuterons implanted into solids von Bo/rgesen, P., Bo/ttiger, J., Möller, W.

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Ranges of ions with Z 1⩾54 in Al and Al2O3 von Andersen, H. H., Bo/ttiger, J., Jo/rgensen, H. Wolder

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Magnetic and transport properties of ion-beam-mixed amorphous Fe-Zr alloys (abstract) von Rao, K. V., Karpe, N., Chen, D.-X., Goldfarb, R., Bo/ttiger, J., Pampus, K., Torp, B.

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Phase formation induced by ion irradiation and electrical resistivity of aluminum–3 d -transition-metal alloys von Karpe, N., Larsen, K. Kyllesbech, Bo/ttiger, J.

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Ion-beam mixing of Al-V films: Structure and Hall effect von Karpe, N, Andersen, L, Dyrbye, K, Bottiger, J, Rao, KV

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Interpretation of channeling effect measurements of disorder in ion-implanted silicon von Eisen, F. H., Bo/ttiger, J.

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Disorder-induced covariation of the residual resistance ratio and superconducting T c of amorphous Zr 60 Cu 40 von Karpe, N., Ahlgren, M., Bo/ttiger, J., Chechenin, N. G., Krog, J. P., Nordström, A., Rapp, Ö.

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Radiation-enhanced diffusion in amorphous Pd-Cu-Si von DYRBYE, K, BØTTIGER, J, PAMPUS, K, TORP, B

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Tracer diffusion in amorphous Pd-Cu-Si von BØTTIGER, J, DYRBYE, K, PAMPUS, K, TORP, B, WIENE, P. H

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Impurity diffusion in icosahedral Al-Mn von BØTTIGER, J, CHEVALLIER, J, MIKKELSEN, N. J, NIELSEN, S. K, TORP, B, RAO, K. V, CHEN, H. S

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