A Nanoparticle Convective Directed Assembly Process for the Fabrication of Periodic Surface Enhanced Raman Spectroscopy Substrates von Liberman, V., Yilmaz, C., Bloomstein, T. M., Somu, S., Echegoyen, Y., Busnaina, A., Cann, S. G., Krohn, K. E., Marchant, M. F., Rothschild, M.

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Nanopatterning with UV Optical Lithography von Rothschild, M., Bloomstein, T. M., Efremow, N., Fedynyshyn, T. H., Fritze, M., Pottebaum, I., Switkes, M.

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22-nm immersion interference lithography von Bloomstein, T M, Marchant, Michael F, Deneault, Sandra, Hardy, Dennis E, Rothschild, Mordechai

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STEREO LASER MICROMACHINING OF SILICON von BLOOMSTEIN, TM, EHRLICH, DJ

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Resists and Other Critical Issues in 157-nm Lithography von Rothschild, M., Bloomstein, T. M., Fedynyshyn, T. H., Kunz, R. R., Liberman, V., Switkes, M.

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Patterning of sub-50 nm dense features with space-invariant 157 nm interference lithography von Switkes, M., Bloomstein, T. M., Rothschild, M.

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Fluorine—an enabler in advanced photolithography von Rothschild, M., Bloomstein, T.M., Fedynyshyn, T.H., Liberman, V., Mowers, W., Sinta, R., Switkes, M., Grenville, A., Orvek, K.

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Liquid immersion lithography: Why, how, and when? von Rothschild, M., Bloomstein, T. M., Kunz, R. R., Liberman, V., Switkes, M., Palmacci, S. T., Sedlacek, J. H. C., Hardy, D., Grenville, A.

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Outlook for 157 nm resist design von Kunz, R. R., Bloomstein, T. M., Hardy, D. E., Goodman, R. B., Downs, D. K., Curtin, J. E.

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Materials issues for optical components and photomasks in 157 nm lithography von Liberman, V., Bloomstein, T. M., Rothschild, M., Sedlacek, J. H. C., Uttaro, R. S., Bates, A. K., Van Peski, C., Orvek, K.

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157 nm: Deepest deep-ultraviolet yet von Rothschild, M., Bloomstein, T. M., Curtin, J. E., Downs, D. K., Fedynyshyn, T. H., Hardy, D. E., Kunz, R. R., Liberman, V., Sedlacek, J. H. C., Uttaro, R. S., Bates, A. K., Van Peski, C.

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Applications of lasers in microelectronics and micromechanics von Kunz, R.R., Horn, M.W., Bloomstein, T.M., Ehrlich, D.J.

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Nanopatterning with UV optical lithography: Fabrication of Sub-45-nm structures for the next generation of devices von ROTHSCHILD, M, BLOOMSTEIN, T. M, EFREMOW, N. JR, FEDYNYSHYN, T. H, FRITZE, M, POTTEBAUM, I, SWITKES, M

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Hybrid optical maskless lithography: Scaling beyond the 45 nm node von Fritze, M., Bloomstein, T. M., Tyrrell, B., Fedynyshyn, T. H., Efremow, N. N., Hardy, D. E., Cann, S., Lennon, D., Spector, S., Rothschild, M., Brooker, P.

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Standard Chemical Thermodynamic Properties of Alkylnaphthalene Isomer Groups von Alberty, Robert A., Bloomstein, Theodore M.

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A variable-transmittance apodizing filter at 157 nm von Bloomstein, Theodore, Hardy, Dennis, Rothschild, Mordechai

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Direct patterning of spin-on glass with 157 nm lithography: Application to nanoscale crystal growth von Bloomstein, T. M., Juodawlkis, P. W., Swint, R. B., Cann, S. G., Deneault, S. J., Efremow, N. N., Hardy, D. E., Marchant, M. F., Napoleone, A., Oakley, D. C., Rothschild, M.

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Immersion patterning down to 27 nm half pitch von Bloomstein, T. M., Fedynyshyn, T. H., Pottebaum, I., Marchant, M. F., Deneault, S. J., Rothschild, M.

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Immersion patterning down to 27nm half pitch von Bloomstein, T. M., Fedynyshyn, T. H., Pottebaum, I., Marchant, M. F., Deneault, S. J., Rothschild, M.

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Hybrid optical maskless lithography: Scaling beyond the 45nm node von Fritze, M., Bloomstein, T. M., Tyrrell, B., Fedynyshyn, T. H., Efremow, N. N., Hardy, D. E., Cann, S., Lennon, D., Spector, S., Rothschild, M., Brooker, P.

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