Operation modes of the FALCON ion source as a part of the AMS cluster tool von Girka, Oleksii, Bizyukov, Alexander, Bizyukov, Ivan, Gutkin, Michael, Mishin, Sergei

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Evolution of the 2D surface structure of a silicon pitch grating under argon ion bombardment: Experiment and modeling von Bizyukov, Ivan, Mutzke, Andreas, Schneider, Ralf, Davis, James

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Nano-scale modification of 2D surface structures exposed to 6 keV carbon ions: Experiment and modeling von Mutzke, Andreas, Bizyukov, Ivan, Schneider, Ralf, Davis, James

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Relevance of surface roughness to tungsten sputtering and carbon implantation von Bizyukov, Ivan, Krieger, Karl, Azarenkov, Nikolay, Toussaint, Udo v.

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Study of interaction of C+ ion beam with a Si pitch grating on a macro-scale level von Mutzke, Andreas, Bizyukov, Ivan, Langhuth, Hagen, Mayer, Matej, Krieger, Karl, Schneider, Ralf

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Macroscopic parameters of the interaction of an Ar+ ion beam with a Si pitch grating von Bizyukov, Ivan, Mutzke, Andreas, Mayer, Matej, Langhuth, Hagen, Krieger, Karl, Schneider, Ralf

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Nano-scale modification of 2D surface structures exposed to 6keV carbon ions: Experiment and modeling von Mutzke, Andreas, Bizyukov, Ivan, Schneider, Ralf, Davis, James

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Principal processes occurring at simultaneous bombardment of tungsten by carbon and deuterium ions von Bizyukov, Ivan, Krieger, Karl

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Transition from tungsten erosion to carbon layer deposition with simultaneous bombardment of tungsten by helium and carbon von Bizyukov, Ivan, Krieger, Karl

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Morphology and changes of elemental surface composition of tungsten bombarded with carbon ions von Bizyukov, Ivan, Mutzke, Andreas, Schneider, Ralf, Gigler, Alexander M., Krieger, Karl

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Relevance of surface roughness to tungsten sputteringand carbon implantation von Bizyukov, Ivan, Krieger, Karl, Azarenkov, Nikolay, Toussaint, Udo v.

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TWI803032B von BIZYUKOV, IVAN

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Plasma processing device and processing method thereof characterized by adding the gas supplying sources connected to the gas channel and using the valve to control the kind and fl... von BIZYUKOV, IVAN

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TWI752523B von BIZYUKOV, IVAN

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Spectrum detection equipment, End Point Detector, and method wherein the system includes a diffraction grating, an image sensor, and a baffle between the diffraction grating and th... von BIZYUKOV, IVAN

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Spectrum detection equipment, terminal point detection system and terminal point detection method von IVAN BIZYUKOV

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TWI828240B von BIZYUKOV, IVAN, WANG, SHAO-LIN, YANG, JAMES

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Method of determining center of electrostatic chuck on wafer, wafer centering method, electronic equipment and computer-readable recording medium to accurately calculate the center... von BIZYUKOV, IVAN, WANG, SHAO-LIN, YANG, JAMES

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Aging treatment method for electrostatic chuck von YE RUBIN, IVAN BIZYUKOV

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Electrostatic sucker, manufacturing method, refurbishment method, and plasma reactor for easily manufacturing and refurbishment to reduce manufacturing cost of wafers von BIZYUKOV, IVAN, SU, XINGCAI, YE, RUBIN

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