Controlling Piezoelectric Responses in Pb(Zr0.52Ti0.48)O3 Films through Deposition Conditions and Nanosheet Buffer Layers on Glass von Nguyen, Minh D, Houwman, Evert P, Yuan, Huiyu, Wylie-van Eerd, Ben J, Dekkers, Matthijn, Koster, Gertjan, ten Elshof, Johan E, Rijnders, Guus

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Controlling Piezoelectric Responses in Pb(Zr 0.52 Ti 0.48 )O 3 Films through Deposition Conditions and Nanosheet Buffer Layers on Glass von Nguyen, Minh D, Houwman, Evert P, Yuan, Huiyu, Wylie-van Eerd, Ben J, Dekkers, Matthijn, Koster, Gertjan, Ten Elshof, Johan E, Rijnders, Guus

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Structure Determination and Compositional Modification of Body-Centered Tetragonal PX-Phase Lead Titanate von Wang, Jin, Schenk, Kurt, Carvalho, Alexandra, Eerd, Ben Wylie-van, Trodahl, Joe, Sandu, Cosmin S, Bonin, Michel, Gregora, Ivan, He, Zhanbing, Yamada, Tomoaki, Funakubo, Hiroshi, Briddon, Patrick R, Setter, Nava

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Negative-pressure-induced enhancement in a freestanding ferroelectric von Wang, Jin, Wylie-van Eerd, Ben, Sluka, Tomas, Sandu, Cosmin, Cantoni, Marco, Wei, Xian-Kui, Kvasov, Alexander, McGilly, Leo John, Gemeiner, Pascale, Dkhil, Brahim, Tagantsev, Alexander, Trodahl, Joe, Setter, Nava

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The Structural Complexity of (Bi0.5Na0.5)TiO3-BaTiO3 as Revealed by Raman Spectroscopy von Ben Wylie-van Eerd, Damjanovic, Dragan, Klein, Naama, Setter, Nava, Trodahl, Joe

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Mirror, in particular for a microlithographic projection exposure system von Schulte, Stefan, Gruner, Toralf, Bijkerk, Frederik, Hild, Kerstin, Weyler, Simone, Wylie-Van Eerd, Ben

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Structural complexity of ( Na 0.5 Bi 0.5 ) TiO 3 -BaTiO 3 as revealed by Raman spectroscopy von Wylie-van Eerd, Ben, Damjanovic, Dragan, Klein, Naama, Setter, Nava, Trodahl, Joe

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MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM von GRUNER, Toralf, BIJKERK, Frederik, WYLIE-VAN EERD, Ben, HILD, Kerstin, WEYLER, Simone, SCHULTE, Stefan

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특히 마이크로리소그래픽 투영 노광 시스템용 거울 von GRUNER TORALF, HILD KERSTIN, SCHULTE STEFAN, BIJKERK FREDERIK, WYLIE VAN EERD BEN, WEYLER SIMONE

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MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM von GRUNER TORALF, HILD KERSTIN, SCHULTE STEFAN, WYLIE-VAN EERD BEN, BIJKERK FREDERIK, WEYLER SIMONE

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MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM von GRUNER, Toralf, BIJKERK, Frederik, WYLIE-VAN EERD, Ben, HILD, Kerstin, WEYLER, Simone, SCHULTE, Stefan

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Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage von van Eerd, Ben Wylie, Schulte, Stefan, Gruner, Toralf, Bijkerk, Frederik, Hild, Kerstin, Weyler, Simone

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