Electrical characteristics and conduction mechanisms of amorphous subnanometric Al2O3–TiO2 laminate dielectrics deposited by atomic layer deposition von Kahouli, Abdelkader, Lebedev, Oleg, Dao, Vu Hung, Elbahri, Marwa Ben, Prellier, Wilfrid, Lüders, Ulrike

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Effects of oxygen pressure during deposition on the dielectric properties of amorphous titanium dioxide thin films von Elbahri, Marwa Ben, Kahouli, Abdelkader, Mercey, Bernard, Prellier, Wilfrid, Lüders, Ulrike

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Capacitance-voltage characteristics of sub-nanometric Al2O3 / TiO2 laminates: dielectric and interface charge densities von Kahouli, Abdelkader, Elbahri, Marwa Ben, Lebedev, Oleg, Lüders, Ulrike

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Capacitance-voltage characteristics of sub-nanometric Al 2 O 3  / TiO 2 laminates: dielectric and interface charge densities von Kahouli, Abdelkader, Elbahri, Marwa Ben, Lebedev, Oleg, Lüders, Ulrike

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Electrical characteristics and conduction mechanisms of amorphous subnanometric Al 2 O 3 –TiO 2 laminate dielectrics deposited by atomic layer deposition von Kahouli, Abdelkader, Lebedev, Oleg, Dao, Vu Hung, Elbahri, Marwa Ben, Prellier, Wilfrid, Luders, Ulrike

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Structural and Dielectric Properties of Subnanometric Laminates of Binary Oxides von Kahouli, Abdelkader, Lebedev, Oleg, Ben Elbahri, Marwa, Mercey, Bernard, Prellier, Wilfrid, Riedel, Stefan, Czernohorsky, Malte, Lallemand, Florent, Bunel, Catherine, Lüders, Ulrike

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