Treatment of nanocrystalline diamond films by nitrogen implantation using PIII processing von Miranda, C.R.B., Ueda, M., Baldan, M.R., Beloto, A.F., Ferreira, N.G.

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Structural effect of nitrogen plasma-based ion implantation on ultra-high molecular weight polyethylene von Kostov, K.G, Ueda, M, Tan, I.H, Leite, N.F, Beloto, A.F, Gomes, G.F

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Improvements in CVD/CVI processes for optimizing nanocrystalline diamond growth into porous silicon von Miranda, C.R.B., Braga, N.A., Baldan, M.R., Beloto, A.F., Ferreira, N.G.

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Nanodiamond films growth on porous silicon substrates for electrochemical applications von FERREIRA, N. G, AZEVEDO, A. F, BELOTO, A. F, AMARAL, M, ALMEIDA, F. A, OLIVEIRA, F. J, SILVA, R. F

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An investigation of natural oxidation process on stain-etched nanoporous silicon by micro-Raman spectroscopy von Abramof, P.G., Miranda, C.R.B., Beloto, A.F., Ueta, A.Y., Ferreira, N.G.

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Treatment of polymers by plasma immersion ion implantation for space applications von Tan, I.H, Ueda, M, Dallaqua, R.S, Rossi, J.O, Beloto, A.F, Tabacniks, M.H, Demarquette, N.R, Inoue, Y

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Surface modification of polyethylene terephthalate by plasma immersion ion implantation von Ueda, M, Kostov, K.G, Beloto, A.F, Leite, N.F, Grigorov, K.G

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Improvements in anti-reflection coatings for high-efficiency silicon solar cells von Cid, M., Stem, N., Brunetti, C., Beloto, A.F., Ramos, C.A.S.

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Nitrogen recoil chromium implantation into SAE 1020 steel by means of ion beam or plasma immersion ion implantation von Gomes, G.F., Ueda, M., Reuther, H., Richter, E., Beloto, A.F.

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System for measuring the spatial reflectance distribution of material surfaces von Berni, L A, Ribeiro, M S, Paes, T F, Beloto, A F

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Plasma immersion ion implantation of nitrogen in Si : formation of SiO2, Si3N4 and stressed layers under thermal and sputtering effects von UEDA, M, BELOTO, A. F, REUTHER, H, PARASCANDOLA, S

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Nanodiamond infiltration into porous silicon through etching of solid carbon produced at different graphitization temperatures von Miranda, C. R. B., Baldan, M. R., Beloto, A. F., Ferreira, N. G.

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X-ray investigation of nanostructured stain-etched porous silicon von Abramof, P. G., Beloto, A. F., Ueta, A. Y., Ferreira, N. G.

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Experimental results of a dc glow discharge source with controlled plasma floating potential for plasma immersion ion implantation von Berni, L A, Ueda, M, Gomes, G F, Beloto, A F, Reuther, H

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Magnesium plasma immersion ion implantation on silicon wafers von Tan, I.H., Ueda, M., Dallaqua, R.S., Rossi, J.O., Beloto, A.F., Abramof, E.

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Sponge-like and columnar porous silicon implanted with nitrogen by plasma immersion ion implantation (PIII) von Beloto, A.F, Ueda, M, Abramof, E, Senna, J.R, da Silva, M.D, Kuranaga, C, Reuther, H, Ferreira da Silva, A, Pepe, I

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Surface improvements of industrial components treated by plasma immersion ion implantation (PIII): results and prospects von Ueda, M, Berni, L.A, Castro, R.M, Beloto, A.F, Abramof, E, Rossi, J.O, Barroso, J.J, Lepienski, C.M

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Reflectance Measurements of Annealed Porous Silicon Implanted with Nitrogen by Plasma Immersion Ion Implantation von Beloto, A.F., Silva, M.D., Senna, J.R., Kuranaga, C., Leite, N.F., Ueda, M.

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Enhancement of surface properties of SAE 1020 by chromium plasma immersion recoil implantation von Ueda, M., Mello, C.B., Beloto, A.F., Rossi, J.O., Reuther, H.

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Results of the solar cell experiment of the first Brazilian satellite von Veissid, N., Nubile, P., Beloto, A.F.

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