Copper Catalysis Effect Investigation for TiW Etch Process on Patterned Wafers von Votta, Annamaria, Bellandi, Enrico, Venegoni, Ivan, Alessandri, Mauro, Pipia, Francesco

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An optical study of alumina films thermal evolution upon ammonia annealing von Bellandi, Enrico, Del Vitto, Annalisa, Nale, Angelo Claudio, Piagge, Rossella, Caniatti, Massimo, Alessandri, Mauro

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AlCu Metal Line Corrosion: A Case Study von Alessandri, Mauro, Votta, Annamaria, Nolan, Thomas, Bellandi, Enrico, Obetti, Gloria, Pipia, Francesco

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Influence of Dry Ashing and Wet Treatments on NVM Metal Gate Structures von Alessandri, Mauro, Avaro, Luigi M., Elbaz, Alice C., Piva, Roberta, De Marco, Cinzia, Bellandi, Enrico, Ravizza, Enrica

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Etch Rate Profile Characterization of High-κ Materials von Caniatti, Massimo, Piagge, Rosella, Alessandri, Mauro, Votta, Annamaria, Bellandi, Enrico, Pipia, Francesco

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Influence of Wet Cleaning on Tungsten Deposited with Different Techniques von Alessandri, Mauro, Bresolin, C., Elbaz, Alice C., Borsari, S., Votta, Annamaria, Ravizza, Enrica, Bellandi, Enrico, Pipia, Francesco

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Impact of RF Oxygen Plasma on Thermal Oxide Etch-Rate von Alessandri, Mauro, Ferrerio, Matteo, De Marco, Cinzia, Votta, Annamaria, Bellandi, Enrico, Pipia, Francesco, Alba, Simone

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All-Wet Stripping of FEOL Photoresist Using Mixtures of Sulphuric Acid von Alessandri, Mauro, Hellweg, Thomas, Archer, Leo, Henry, Sally Ann, Brilz, Ladislaus, Kagerer, Michael, Bellandi, Enrico, Detterbeck, Stefan

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Study of SiO2 Modifications Induced by Oxygen Plasmas and Their Effect on Wet Processes von Votta, Annamaria, Bellandi, Enrico, Alessandri, Mauro, Vedda, Anna, Ferretti, Anna, Fasoli, Mauro, Moretti, Federico

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High-k Materials in Flash Memories von Alessandri, Mauro, Piagge, Rossella, Alberici, Stefano, Bellandi, Enrico, Caniatti, Massimo, Ghidini, Gabriella, Modelli, Alberto, Pavia, Giuseppe, Ravizza, Enrica, Sebastiani, Alessandro, Wiemer, Claudia, Spiga, Sabina, Fanciulli, Marco, Fiorentini, Vincenzo, Cadelano, Emiliano, Lopez, Giorgia Maria

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Structural and Chemical Investigation of Annealed Al2O3 Films for Interpoly Dielectric Application in Flash Memories von Alessandri, Mauro, Piagge, Rossella, Caniatti, Massimo, Del Vitto, Annalisa, Wiemer, Claudia, Pavia, Giuseppe, Alberici, Stefano, Bellandi, Enrico, Nale, Angeloclaudio

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Arrays of silicon structures including metal silicide regions, and related semiconductor device structures von LAZZARI CARLA M, BELLANDI ENRICO

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Behaviour of High-k Dielectric Materials with Classical Cleaning Chemistries von Crivelli, Barbara, Alessandri, Mauro, Bellandi, Enrico

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ARRAYS OF SILICON STRUCTURES INCLUDING METAL SILICIDE REGIONS, AND RELATED SEMICONDUCTOR DEVICE STRUCTURES von LAZZARI CARLA M, BELLANDI ENRICO

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Methods of forming a metal silicide region on at least one silicon structure von BELLANDI ENRICO, LAZZARI CARLA MARIA

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Etch Rate Depth Profiling by Single Wafer Etching Equipment von Elbaz, Alice C., Piagge, Rosella, Alessandri, Mauro, Bellandi, Enrico, Pipia, Francesco

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METHODS OF FORMING A METAL SILICIDE REGION ON AT LEAST ONE SILICON STRUCTURE von LAZZARI CARLA M, BELLANDI ENRICO

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Fe and Cu Removal Efficiency in HF-DIW/O3 Cleaning Sequence von Crivelli, Barbara, Alessandri, Mauro, Bellandi, Enrico, Pipia, Francesco

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Particle Removal Efficiency and Silicon Roughness in HF-DIW/O3/Megasonics Cleaning von Alessandri, Mauro, Cazzaniga, F., Wolke, K., Schenkl, M., Bellandi, Enrico, Pipia, Francesco

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Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment von Landa, F., Bernard, H., Petitdidier, Sébastien, Bellandi, Enrico, Shirakawa, H., Lévy, Didier

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