Surface activation using remote plasma for silicon to quartz wafer bonding von Belford, R. E., Sood, S.

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Partially depleted SOI MOSFETs under uniaxial tensile strain von Wei Zhao, Jianli He, Belford, R.E., Wernersson, L.-E., Seabaugh, A.

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Efficient Multistep Photoinitiated Electron Transfer in a Molecular Pentad von Gust, Devens, Moore, Thomas A., Moore, Ana L., Lee, Seung-Joo, Bittersmann, Edith, Luttrull, David K., Rehms, Aden A., DeGraziano, Janice M., Ma, Xiaochun C., Gao, Feng, Belford, Robert E., Trier, Todd T.

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Mechanically induced strain enhancement of metal–oxide–semiconductor field effect transistors von Haugerud, B. M., Bosworth, L. A., Belford, R. E.

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Uniaxial, tensile-strained Si devices von BELFORD, Rona E

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Elevated-temperature electrical characteristics of mechanically strained Si devices von Haugerud, B. M., Bosworth, L. A., Belford, R. E.

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Interference grating fabrication in spin-coated As2S3 films von HAJTO, E, EWEN, P. J. S, BELFORD, R. E, OWEN, A. E

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Temperature dependent ac impedance studies of glass to metal contacts in solid state glass ph sensors von Belford, R.E., Owen, A.E.

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Surface Activation Using Remote Plasma for Hydrophilic Bonding at Elevated Temperature von Belford, R. E., Sood, S.

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Strained Si via Plasma Enhanced dTCE Bonding von Sood, Sumant, Belford, Rona

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Surface Activation Using Remote Plasma for a New Wafer Bonding Route to Strained-Si von Sood, Sumant, Belford, Rona

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Strain enhanced p -type metal oxide semiconductor field effect transistors von Belford, R. E., Guo, B. P., Xu, Q., Sood, S., Thrift, A. A., Teren, A., Acosta, A., Bosworth, L. A., Zell, J. S.

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Nitroxyl free radical enhancement of the forbidden O2(3Σg-)←O2(1Δg) radiative transition in chlorinated hydrocarbon solvents von BELFORD, R. E, SEELY, G, GUST, D, MOORE, T. A, MOORE, A, CHEREPY, N. J, EKBUNDIT, S, LEWIS, J. E, LIN, S. H

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The selective removal of the negative high-resolution photoresist system AgAsS von Belford, R.E., Hajto, E., Owen, A.E.

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Thick-film hybrid pH sensors von Belford, R.E., Owen, A.E., Kelly, R.G.

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Dry etched high resolution positive and negative inorganic photoresist von Hajto, E., Belford, R.E., Ewen, P.J.S., Owen, A.E.

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The effects of mechanical planar biaxial strain in Si/SiGe HBT BiCMOS technology von Haugerud, Becca M., Nayeem, Mustayeen B., Krithivasan, Ramkumar, Lu, Yuan, Zhu, Chendong, Cressler, John D., Belford, Rona E., Joseph, Alvin J.

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Performance-augmented CMOS using back-end uniaxial strain von Belford, R.E., Wei Zhao, Potashnik, J., Qingmin Liu, Seabaugh, A.

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Amorphous semiconductors von Reynolds, S, Belford, R.E

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Nitroxyl free radical enhancement of the forbidden O 2( 3Σ −g) ← O 2( 1Δ g) radiative transition in chlorinated hydrocarbon solvents von Belford, R.E., Seely, G., Gust, D., Moore, T.A., Moore, A., Cherepy, N.J., Ekbundit, S., Lewis, J.E., Lin, S.H.

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