Stress distribution in chemical mechanical polishing von Srinivasa-Murthy, C, Wang, D, Beaudoin, S.P, Bibby, T, Holland, K, Cale, T.S

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Study on the Mechanical Properties of CMP Pads von Bum Soo Kim, Tucker, M.H., Kelchner, J.D., Beaudoin, S.P.

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Hydrodynamic particle removal from surfaces von Burdick, G.M., Berman, N.S., Beaudoin, S.P.

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Guest Editorial Special Section on Microelectronics Manufacturing: Prosperity and Environmental Stewardship von Beaudoin, S.P., Content, R.M., Losey, L., Shadman, F.

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Removal of organic films from solid surfaces using aqueous solutions of nonionic surfactants. 1. Experiments von Beaudoin, Stephen P, Grant, Christine S, Carbonell, Ruben G

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Removal of organic films from solid surfaces using aqueous solutions of nonionic surfactants. 2. Theory von Beaudoin, Stephen P, Grant, Christine S, Carbonell, Ruben G

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Downstream microwave ammonia plasma treatment of polydimethylsiloxane von Pruden, K. G., Beaudoin, S. P.

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Ammonium chloride complex formation during downstream microwave ammonia plasma treatment of parylene-C von Pruden, K. G., Beaudoin, S. P.

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Effects of carrier film physical properties on W CMP von WANG, D, ZUTSHI, A, BIBBY, T, BEAUDOIN, S. P, CALE, T. S

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Comparison of teaching styles in chemical engineering von Johnson, A.K., Beaudoin, S.P.

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Low temperature near-field scanning optical microscopy on infrared and terahertz photonic-crystal quantum cascade lasers von Moldovan-Doyen, I. C., Xu, G., Greusard, L., Sevin, G., Strupiechonski, E., Beaudoin, G., Sagnes, I., Khanna, S. P., Linfield, E. H., Davies, A. G., Colombelli, R., De Wilde, Y.

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